真空 ›› 2019, Vol. 56 ›› Issue (6): 1-6.doi: 10.13385/j.cnki.vacuum.2019.06.01
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吴厚朴, 田钦文, 田修波, 巩春志
WU Hou-pu, TIAN Qin-wen, TIAN Xiu-bo, GONG Chun-zhi
摘要： 独立设计研制了新型两段式双极性脉冲高功率脉冲磁控溅射电源,本电源具备3种工作模式：（1）传统高功率脉冲磁控溅射（HiPIMS）放电模式,（2）双极性脉冲高功率脉冲磁控溅射（BP-HiPIMS）放电模式和（3）两段式双极性脉冲高功率脉冲磁控溅射（DBP-HiPIMS）放电模式。特别是新提出的第三种工作模式,两段式双极性脉冲较传统的单段双极性脉冲具有较大的优势。本文研究了在传统BP-HiPIMS和新DBP-HiPIMS条件下,正向脉冲对Cr靶在Ar气气氛下的放电特性的影响。研究发现：随着正向脉冲电压的增加,BP-HiPIMS和DBP-HiPIMS基体净离子平均电流均明显提高,且相比传统BP-HiPIMS模式,新型DBP-HiPIMS放电模式在不同正向脉冲电压时均具有更高的基体净离子平均电流。正向脉冲电压为100V时,在基体偏压为0V和60V条件下,DBP-HiPIMS模式的基体净离子平均电流较传统BP-HiPIMS模式分别提高47.0%和30.3%。表明新型DBP-HiPIMS放电模式能够进一步提高正向脉冲对离子的推动加速作用,这将有利于膜层质量的提高。
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