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真空 ›› 2019, Vol. 56 ›› Issue (1): 39-44.doi: 10.13385/j.cnki.vacuum.2019.01.08

• • 上一篇    

热蒸发沉积 TiO2 薄膜的光学及激光损伤特性

徐均琪 1,李候俊 1,李 绵 1,王 建 1,苏俊宏 1,基玛·格拉索夫 2   

  1. 1.西安工业大学陕西省薄膜技术与光学检测重点实验室,西安 710021; 2.白俄罗斯国立信息与无线电电子大学,明斯克 220013
  • 收稿日期:2018-05-01 出版日期:2019-01-25 发布日期:2019-02-25
  • 作者简介:徐均琪(1973-),男,陕西省西安市人,教授,博士。
  • 基金资助:
    陕西省国际科技合作与交流计划资助项目(2016KW-036),陕西省教育厅重点实验室科研计划项目(16JS037), 陕西省科技厅自然科学基础研究计划(2016JZ025),科技部国际合作资助项目(2013DFR70620)。

Optical and laser damage characteristics of TiO2 films prepared by thermal evaporation deposition technique

XU Jun-qi1, LI Hou-jun1, LI Mian1, WANG Jian1, SU Jun-hong1, GOLOSOV Dmitriy A.2   

  1. 1.Shaanxi Province Thin Film Technology and Optical Test Open Key Laboratory, Xi'an Technological University, Xi'an 710021, China; 2.Belarusian State University of Informatics and Radioelectronics , Minsk 220013, Belarus
  • Received:2018-05-01 Online:2019-01-25 Published:2019-02-25

摘要: 采用电子束热蒸发技术,用不同沉积速率制备了 TiO2 薄膜。根据透射率谱计算了薄膜的光学带隙,采用椭偏法测量了薄膜的折射率、消光系数及厚度,分析了薄膜内部的电场强度分布,对其激光损伤特性进行了研究。结果表明,在所研究的工艺参数范围内,TiO2 薄膜的光学带隙比较稳定,随沉积速率的变化并不显著,其值大小在 3.95eV -3.97eV。当沉积速率从 0.088nm/s,0.128nm/s 增加到 0.18nm/s 时,薄膜折射率从 1.9782,1.9928,升高到 2.0021(波长 1064nm),但当沉积速率继续增加到 0.327nm/s 时,折射率反而降低到 1.9663,薄膜的消光系数随着沉积速率的增加单调增加。采用同一高能激光损伤薄膜后,当沉积速率较低时制备薄膜的损伤斑大小基本一致,但以 0.327nm/s 较高速率制备的薄膜,其损伤斑明显增大。高沉积速率下制备的 TiO2 薄膜的吸收较大,激光损伤阈值较低

关键词: 薄膜, TiO2, 光学带隙, 折射率, 激光损伤阈值, 电场强度

Abstract: TiO2 films were prepared by electron beam evaporation deposition technique with different deposition rates. Based on transmittance spectrums of the samples, the optical band gaps of films were obtained. The refractive index, extinction coefficient and thickness of the films were investigated by using an ellipsometer. The electric field intensity of the film was analyzed and the laser damage characteristics were studied. It was found that the optical band gap of TiO2 film was relatively stable in the range of process factors, and the change corresponding to the deposition rate was not significant, among 3.95eV -3.97eV. The ellipsometry test results showed that the refractive index increased from 1.9782, 1.9928, to 2.0021 (at the wavelength of 1064 nm) with the increasing of deposition rate from 0.088nm/s,0.128nm/s to 0.18 nm/s, whereas decreased to 1.9663 at the deposition rate of 0.327nm/s. The extinction coefficient of the film increased with the enhancement of deposition rate. Broken by the same high energy laser, the sizes of the laser damage spots of the films which deposited at the low deposition rate were almost the same. However, the spot size was significantly enlarged when the film was prepared at the deposition rate of 0.327nm/s. The films with low absorption and high laser-induced damage threshold can be obtained at low deposition rates.

Key words: thin film, TiO2, optical band gap, refractive index, LIDT, electric field intensity

中图分类号: 

  • O484.4
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