Abstract: The anode layer ion source, with simple structure, high beam density and controllable ion energy, can be applied for surface modification especially in large area. It can be also applied for applications of ion beam assisted deposition, thin film etching and surface cleaning. This paper reviews the history and development of anode layer ion source. It introduces the principles of anode layer ion source and research status, discusses its key designs, including the design requirements of magnetic field, electromagnetic field and gas discharge simulation. Finally, it summarizes the applications and future developments of anode layer ion source.

Key words: anode layer ion source, electromagnetic field, plasma, surface modification