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VACUUM ›› 2025, Vol. 62 ›› Issue (2): 68-76.doi: 10.13385/j.cnki.vacuum.2025.02.11

• Thin Film • Previous Articles     Next Articles

Development and Application of Intelligent DLC Thin Films by PIAD Technology——Study on Application to Metal Separators for Fuel Cells

OGATA Kiyoshi1, SUZUKI Yasuo1, BI Tingting2   

  1. 1. Plasma Ion Assist Co., Ltd., Kyoto 612-8373, Japan;
    2. Dalian Jintai Xieli Technology Co., Ltd., Dalian 116100, China
  • Received:2023-12-20 Online:2025-03-25 Published:2025-03-24

Abstract: The principles and characteristics of the plasma ion assisted deposition (PIAD) method are described, in which ions generated by ionizing raw material gas by high-frequency discharge are implanted into a base material to which a high voltage pulse voltage is applied. The characteristics and application examples of the diamond-like carbon thin film (DLC thin film) formed by PIAD method are introduced. The PIAD method can control the growth of the sp2-structured graphite layer and the sp3-structured diamond layer in the DLC thin film by pulse voltage and other film-forming conditions, so the DLC thin film that exhibits corrosion resistance and conductivity can be formed. The results of the development of functional DLC thin film prepared by the PIAD method in surface treatment for the metal separator of the fuel cells are introduced emphatically.

Key words: DLC film, fuel cell, metal separator, thin film coating

CLC Number:  O484

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