薄膜的材料特征*

doi:10.13385/j.cnki.vacuum.2020.04.03

Abstract

Abstract: There are a variety of PVD and CVD coating techniques using plasma and energetic beams. However, commonly used industrial coatings involve only a few materials, such as metal nitrides and amorphous carbon. To address such a phenomenon, this paper proposes three basic principles of thin film material selection, i.e., composition tolerance, structural stability and electrical conductivity. Three kinds of typical coating materials are then explained based on the principles, namely titanium nitride representative of solid solution materials, amorphous boride, and Cr-doped diamond-like carbon, stressing that the selection of thin film materials is derived from the balance between process characteristics and material performance, and is dominated by processability. It is pointed out that the material compositions must be precisely regulated to achieve the best matching of processability and performance, while material compositions are rooted in chemical short-range-order structures. By introducing the cluster-plus-glue-atom model developed by our research group, molecule-like local structural units and the corresponding composition formulas are constructed and they explain the compositions of thin film materials in use. The perspective of using this method as thin film composition design is envisaged.

Key words: thin films, composition design, titanium nitride, amorphous boride, metal-doped diamond-like carbon, cluster-plus-glue-atom model

CLC Number:

TB43

ZHANG Shuang, DONG Chuang, MA Yan-ping, DING Wan-yu. Material Characteristics of Thin Films[J].VACUUM, 2020, 57(4): 11-18.

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