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VACUUM ›› 2018, Vol. 55 ›› Issue (6): 14-18.doi: 10.13385/j.cnki.vacuum.2018.06.04

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Development of acceleration power supply for a new type high energy ion implantation system

RUAN Qing-dong, PU Shi-hao, CHEN Chang, WEI Yu-ping   

  1. Southwestern Institute of Physics, Chengdu 610041, China
  • Received:2018-03-20 Online:2018-11-25 Published:2018-12-09

Abstract: The acceleration power supply is an important part of high energy ion implantation system and provides energy for ion acceleration. According to the parameter requirements of new type high energy ion implantation system with adjustable voltage from 10kV to 100kV and the ion beam current strength less than 20mA, an acceleration power supply was designed based on DSP to improve the traditional acceleration power supply structure. This paper discussed the main circuit structure of the power supply including three-phase rectifier, buck chopper voltage regulation, full bridge inverter, transformer booster, voltage doubling rectifying circuit and it's simulation analysis.

Key words: accelerator power supply, voltage- doubling rectifier, simulation analysis of saber

CLC Number: 

  • TG434.1
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