Abstract: The cleaning sources with argon ions using vacuum arc discharge technology are new methods to improve the adhesive strength between top layer and substrate, where electrons coming from arc discharge plasma by hollow cathode gun, heater filament gun and vacuum cathode arc sources produce argon ions and then the argon ions were used to clean the samples before coating process. With the help of this technology, bias currents on substrate holder can reach between 10A and 30A under the condition of bias voltages of only 200V. This new clean method has great advantage, since it brings the high ion density. The article also gives a brief introduction on the vacuum arc deposition systems and magnetron sputtering system with this advanced Ar ⁺ cleaning sources.

Key words: vacuum arc discharge argon ion cleaning source, gas arc discharge argon ion cleaning source, adhesive strength, magnetron sputtering system with unbalanced closed magnetron field of cylindrical cathode