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VACUUM ›› 2019, Vol. 56 ›› Issue (4): 19-23.doi: 10.13385/j.cnki.vacuum.2019.04.05

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Study on Performance of Silicon-Based Nitride Phosphors Coated by Plasma-Assisted Atomic Layer Deposition

ZHANG Zi-xin, LIU Zhong-wei, YANG Li-zhen, CHEN Qiang   

  1. Lab of Plasma Physics and Materials, Beijing Institute of Graphic Communication, Beijing, 102600
  • Received:2018-08-24 Published:2019-08-22

Abstract: A plasma-assisted atomic layer deposition method was used to conformally coat the Al2O3 films on the surface of silicon-based nitride phosphor powders by a vibrating fluidized bed. The surface composition, morphology and water resistance of the phosphors before and after coating were tested by the Fourier transform infrared spectroscopy, scanning electron microscopy, transmission electron microscopy and pH meter. The PL luminescence of the phosphor before and after coating was tested by a fluorescence spectrometer. The results show that the alumina is conformally coated on the surface of the phosphor particles. The coating greatly enhances the stability of the phosphor in water. A certain thickness of alumina coating improves the luminescence performance and slightly reduces the color temperature of the phosphor powders.

Key words: plasma-assisted atomic layer deposition, coating, silicon-based nitride phosphors

CLC Number: 

  • TB34
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