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VACUUM ›› 2020, Vol. 57 ›› Issue (5): 11-13.doi: 10.13385/j.cnki.vacuum.2020.05.03

• Thin Film • Previous Articles     Next Articles

Structure and Optical Properties of MoS2 Thin Films Prepared by RF Reactive Magnetron Sputtering

WEI Xian-lu, GONG Chen-yang, XIAO Jian-rong   

  1. College of Science, Guilin University of Technology, Guilin 541004, China
  • Received:2019-07-20 Published:2020-11-06

Abstract: Molybdenum disulfide films were prepared under different pressures by RF reactive magnetron sputtering. The surface morphology, structure and optical properties of the films were characterized by scanning electron microscopy, X-ray diffractometry and UV-Vis spectrometer. The results show that the surface of MoS2 films prepared by RF reactive magnetron sputtering is smooth, uniform and compact with few defects. The films prepared under the deposition pressure of 1.2Pa shows the best crystallinity. The optical band gap of the films increases first and then decreases with the increase of deposition pressure. The optical band gap is the largest at 1.2Pa, which is 1.69eV. The change in the optical band gap of the film is caused by the change in crystallinity of the films and the formation of defects due to the deposition gas pressure.

Key words: molybdenum disulfide films, RF reactive magnetron sputtering, deposition gas pressure, crystal structure, optical band gap

CLC Number: 

  • TB43
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