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VACUUM ›› 2019, Vol. 56 ›› Issue (3): 37-40.doi: 10.13385/j.cnki.vacuum.2019.03.08

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Effect of post-annealing on Mg doped Ga2O3 films deposited by RF magnetron sputtering

LI Ru-yong, DUAN Ping, CUI Min, WANG Ji-you, YUAN An-juan, DENG Jin-xiang1   

  1. College of Applied Sciences, Beijing University of Technology, Beijing 100124 China
  • Received:2018-03-12 Published:2019-06-26

Abstract: In this paper, high-quality Mg doped gallium oxide films were grown by Radio frequency magnetron sputtering (RF magnetron sputtering) with double target alternating sputtering. The as-prepared samples were annealed at 1000 C to explore the properties of Mg-doped Ga2O3 films before and after annealing. The XRD results show that the peaks of (004), (202) and (120) appear after annealing, and the peaks of (401), (601) and (122) become stronger. It is shown that post annealing can change the structure of Mg doped Ga2O3 thin films. After annealing, the AFM results show that the surface RMS roughness of the films increases from 1.36 nm to 17.11nm. The EDS results show that the weight percentage of Mg is increased after annealing. UV-visible transmission spectroscopy studies show that, after annealing, the average light transmittance of Mg doped Ga2O3 at the wavelength range of 200-1500nm reaches to 90% from 80%, the optical absorption edge of the film is blue-shifted and the band gap width becomes large, indicating that the annealing is helpful to improve the film structure and enhance light transmittance. From the photoluminescence spectra, we can see the photoluminescence peaks before annealing are almost negligible compared with that of the annealed films, which indicates that the annealing can significantly change the photoluminescence properties of Mg-doped Ga2O3 films.

Key words: post annealing, Mg doped Ga2O3 thin film, transmittance, optical band gap, photoluminescence spectra

CLC Number: 

  • 0484
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