VACUUM ›› 2018, Vol. 55 ›› Issue (6): 64-67.doi: 10.13385/j.cnki.vacuum.2018.06.14
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YAO Ting-ting 1, ZHONG Zhao-jin 1,2, LI Gang 1, TANG Yong-kang 1, YANG Yong 1, JIN Ke-wu 1, SHENG Hong-xue 1, WANG Tian-qi 1, PENG Saiao 1, JIN Liang-mao 1, SHEN Hong-lie 3, GAN Zhi-ping 1, MA Li-yun 1
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[1] | ZHAO Yan-hui, SHI Wen-bo, LIU Zhong-hai, LIU Zhan-qi, YU Bao-hai. Effect of deposition process parameters on arc ion plating [J]. VACUUM, 2018, 55(6): 49-59. |
[2] | ZHANG Fen-li, DENG Jing-lian, WANG Jie-feng, MENG Qing-yuan. Study on the pretreatment cleaning process of steel tube before coating [J]. VACUUM, 2018, 55(6): 60-63. |
[3] | WANG Xiao-ran, MA Yan-bin, DUAN Ping, LI Ru-yong, ZHUANG Bi-hui, CUI Min, YUAN An-juan, DENG Jin-xiang. Effect of Mg doping concentration on Ga2O3 thin films prepared by RF magnetron sputtering [J]. VACUUM, 2018, 55(6): 68-72. |
[4] | MA Jia-jie, LI Jian-chang, CHEN Bo. Latest studies on memristor's integration and application [J]. VACUUM, 2018, 55(5): 71-85. |
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