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真空 ›› 2019, Vol. 56 ›› Issue (1): 27-33.doi: 10.13385/j.cnki.vacuum.2019.01.06

• • 上一篇    

弧光放电氩离子清洗源

王福贞 1,陈大民 2,颜远全 3   

  1. 1.北京联合大学,北京 100102;2.大连纳晶科技公司,辽宁 大连 116600;3.深圳嘉德真空光电有限公司,深圳 518110
  • 收稿日期:2018-05-10 出版日期:2019-01-25 发布日期:2019-02-19
  • 作者简介:王福贞(1935-),女,天津市人,教授,国务院津贴专家。

The cleaning sources with argon ions using vacuum arc discharge technology

WANG Fu-zhen1, CHEN Da-min2, YAN Yuan-quan3   

  1. 1.Beijing Union University, Beijing 100102, China; 2.Dalian Nano-crystal Tech. Co.,Ltd. Dalian 116600, China; 3.Shenzhen Golden Vacuum Photoelectrics Co.,Ltd. Shenzhen 518110, China
  • Received:2018-05-10 Online:2019-01-25 Published:2019-02-19

摘要: 弧光放电氩离子清洗源是提高膜基结合力的新技术。由空心阴极枪、热丝弧枪、阴极电弧源发 射的高密度弧光电子流把氩气电离,用得到的高密度的氩离子流清洗工件。工件偏压 200V 以下,工件偏 流可以达到 10A-30A,弧光放电氩离子流密度大,对工件的清洗效果好。本文介绍了几种配置弧光放电 氩离子清洗源的电弧离子镀膜机和磁控溅射镀膜机。

关键词: 固体弧光放电氩离子清洗源, 气体弧光放电氩离子清洗源, 结合力, 旋靶管型柱状非平衡闭合 磁场的磁控溅射镀膜机

Abstract: The cleaning sources with argon ions using vacuum arc discharge technology are new methods to improve the adhesive strength between top layer and substrate, where electrons coming from arc discharge plasma by hollow cathode gun, heater filament gun and vacuum cathode arc sources produce argon ions and then the argon ions were used to clean the samples before coating process. With the help of this technology, bias currents on substrate holder can reach between 10A and 30A under the condition of bias voltages of only 200V. This new clean method has great advantage, since it brings the high ion density. The article also gives a brief introduction on the vacuum arc deposition systems and magnetron sputtering system with this advanced Ar + cleaning sources.

Key words: vacuum arc discharge argon ion cleaning source, gas arc discharge argon ion cleaning source, adhesive strength, magnetron sputtering system with unbalanced closed magnetron field of cylindrical cathode

中图分类号: 

  • TB43
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