中频磁控溅射制备氧化钨薄膜及电致变色性能研究*

doi:10.13385/j.cnki.vacuum.2021.05.08

真空 ›› 2021, Vol. 58 ›› Issue (5): 50-56.doi: 10.13385/j.cnki.vacuum.2021.05.08

中频磁控溅射制备氧化钨薄膜及电致变色性能研究^*

魏梦瑶^1,2, 王辉¹, 韩文芳^1,2, 王红莉², 苏一凡², 唐春梅², 代明江², 石倩²

1.华南理工大学,材料科学与工程学院,广东省先进储能材料重点实验室,广东广州 510640;
2.广东省科学院新材料研究所,现代表面工程技术国家工程实验室,广东省现代表面工程技术重点实验室,广东广州 510651

收稿日期:2020-10-12 出版日期:2021-09-25 发布日期:2021-09-23
通讯作者: 石倩,博士,高级工程师。
作者简介:魏梦瑶（1996-）,女,甘肃庆阳人,硕士生。
基金资助:
*广东特支计划资助（2019BT02C629）; 广东省自然科学基金团队项目（2016A030312015）; 广东省科学院科技创新发展专项（2018GDASCX-0402）; 广州市科技计划项目 (202007020008)

Study on Electrochromic Properties of Tungsten Oxide Films Deposited by Medium Frequency Magnetron Sputtering

WEI Meng-yao^1,2, WANG Hui¹, HAN Wen-fang^1,2, WANG Hong-li², SU Yi-fan², TANG Chun-mei², DAI Ming-jiang², SHI Qian²

1. South China University of Technology,School of Materials Science and Engineering,Guangdong Key Laboratory of Advanced Energy Storage Materials,Guangzhou,510640;
2. Guangdong Academy of Sciences,Guangdong Institute of New Materials,National Engineering Laboratory for Modern Surface Engineering Technology,Guangdong Key Laboratory of Modern Surface Engineering Technology,Guangzhou 510651,China

Received:2020-10-12 Online:2021-09-25 Published:2021-09-23

摘要/Abstract

摘要： 采用中频磁控溅射方法,在氧化铟（ITO）玻璃上采用氧化钨（WO₃）陶瓷靶沉积薄膜,研究溅射气压对WO₃薄膜结构与光学性能的影响规律,并对其电致变色行为进行了探讨。采用X射线衍射（XRD）和扫描电子显微镜（SEM）分析了WO₃薄膜的成分结构和表面形貌,紫外可见分光光度计和电化学工作站对薄膜的光调制性能、电致变色伏安特性、以及循环寿命性能进行了研究,并利用X射线光电子能谱（XPS）对WO₃薄膜在着色、褪色状态下进行了化学成分及氧化状态分析。结果表明：随着溅射气压的增大,WO₃薄膜的形貌结构变得疏松、粗糙,更有利于Li⁺的注入与脱出,响应速度变快、调制幅度增大、电致变色性能优异,但循环寿命性能有所降低。当溅射气压为4Pa时WO₃薄膜的电致变色综合性能最好,在550nm处的调制幅度可达81.0%,着色、褪色响应时间分别为7.8s、5.85s,且在1500次循环后,仍保持较高的电致变色性能。

关键词: WO₃薄膜, 中频磁控溅射, 电致变色, 溅射气压, 循环寿命

Abstract: The tungsten oxide（WO₃） films on transparent conductive indium oxide glass were prepared by mid-frequency magnetron sputtering technique.The effect of sputtering pressure on the microstructure and optical properties of WO₃ thin films was studied.The composition and surface morphology of WO₃ films were analyzed by X-ray diffraction analysis and scanning electron microscopy.The electrochromic voltammetry,light modulation and cycle life of the WO₃ films were studied by electrochemical workstation and UV-Vis spectrophotometer.The chemical composition and oxidation state of WO₃ film in the state of coloring and bleaching were analyzed by X-ray photoelectron spectroscopy.The results show that the WO₃ films are all amorphous.With the increase of sputtering pressure,the morphology of WO₃ films structure becomes loose and rough,which is in favor of the intercalation/de-intercalation of Li⁺.The films deliver the fast response speed,wide amplitude modulation and excellent electrochromic performance,however,the poor cycling stability.When the sputtering pressure is 4Pa,the best electrochromic properties with the modulation amplitude of 81.0% at 550nm and coloring/bleaching response time of 7.8s/5.85s were obtained,which were well maintained after 1500 cycles.

Key words: WO₃ thin film, mid-frequency magnetron sputtering, electrochromism, sputtering pressure, cycle lifetime

中图分类号:

TB34

魏梦瑶, 王辉, 韩文芳, 王红莉, 苏一凡, 唐春梅, 代明江, 石倩. 中频磁控溅射制备氧化钨薄膜及电致变色性能研究^*[J]. 真空, 2021, 58(5): 50-56.

WEI Meng-yao, WANG Hui, HAN Wen-fang, WANG Hong-li, SU Yi-fan, TANG Chun-mei, DAI Ming-jiang, SHI Qian. Study on Electrochromic Properties of Tungsten Oxide Films Deposited by Medium Frequency Magnetron Sputtering[J]. VACUUM, 2021, 58(5): 50-56.

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中频磁控溅射制备氧化钨薄膜及电致变色性能研究^*

Study on Electrochromic Properties of Tungsten Oxide Films Deposited by Medium Frequency Magnetron Sputtering

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