脉冲负偏压对直流磁控溅射碳膜结构和性能的影响

doi:10.13385/j.cnki.vacuum.2019.02.14

Abstract

Abstract: Carbon films were deposited on different substrates, such as silicon, high-speed steel and stainless steel, by magnetron sputtering. Keeping other parameters constant, the pulsed negative bias varying from 100 V to 400 V was applied to the substrate in order to investigate the change of micro-structure and performance of the carbon films. The results show that all the as-deposited carbon films are amorphous and hard with good surface quality. The hardness, thickness as well as deposition rate of the carbon films increase initially and then decrease with increasing pulsed bias, while the friction coefficient behaves oppositely. The optimized mechanical properties of the carbon films are obtained at the pulsed negative bias of 200 V.

Key words: magnetron sputtering, carbon film, pulsed negative bias, hardness

CLC Number:

TB43

LIU Chan, WANG Dong-wei, LI Xiao-min, WU Ying-tong, HUANG Mei-dong. Influence of pulsed negative bias on structure and properties of carbon films grown by magnetron sputtering[J].VACUUM, 2019, 56(2): 69-73.

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Influence of pulsed negative bias on structure and properties of carbon films grown by magnetron sputtering

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