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VACUUM ›› 2020, Vol. 57 ›› Issue (2): 94-96.doi: 10.13385/j.cnki.vacuum.2020.02.18

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  • Online:2020-03-25 Published:2020-04-26

CLC Number: 

  • O484
[1] . [J]. VACUUM, 2020, 57(1): 94-96.
[2] WU Hou-pu, TIAN Qin-wen, TIAN Xiu-bo, GONG Chun-zhi. Development and Discharge Behavior of Novel Double Bipolar Pulse High Power Impulse Magnetron Sputtering System [J]. VACUUM, 2019, 56(6): 1-6.
[3] . [J]. VACUUM, 2019, 56(6): 85-86.
[4] LI Hao, WANG Dong-wei, ZHANG Chuan, LIU Chan, HUANG Mei-dong. Study on corrosion-resistance of Cr/CrN multilayers by arc ion plating [J]. VACUUM, 2019, 56(3): 21-26.
[5] . [J]. VACUUM, 2019, 56(3): 78-80.
[6] ZHAO Yun, MU Jia-li, LI Ming-hua, LI Wen-long, YAO Chun-long. Research on improvement of film surface defects of reflectors based on QFD and DOE [J]. VACUUM, 2019, 56(3): 32-36.
[7] ZHANG Fen-li, WANG Jie-feng, DENG Jing-lian, SUN Hui-fang. Application of self-cleaning anti-reflection coating in solar collector tube [J]. VACUUM, 2019, 56(3): 41-43.
[8] . [J]. VACUUM, 2019, 56(2): 78-80.
[9] XU Jun-qi, LI Hou-jun, LI Mian, WANG Jian, SU Jun-hong, GOLOSOV Dmitriy A.. Optical and laser damage characteristics of TiO2 films prepared by thermal evaporation deposition technique [J]. VACUUM, 2019, 56(1): 39-44.
[10] LI Lin, LI Cheng-ming, YANG Gong-shou, HU Xi-duo, YANG Shao-yan, SU Ning. Numeric simulation of three-layer hot-wall metal organic chemical vapor deposition (MOCVD) flow fields [J]. VACUUM, 2019, 56(1): 34-38.
[11] WANG Xiao-ran, MA Yan-bin, DUAN Ping, LI Ru-yong, ZHUANG Bi-hui, CUI Min, YUAN An-juan, DENG Jin-xiang. Effect of Mg doping concentration on Ga2O3 thin films prepared by RF magnetron sputtering [J]. VACUUM, 2018, 55(6): 68-72.
[12] YUE Ling, SHI Yue-juan, MA Yu-shan, LIU Hai-bo, ZHOU Yong-xing, ZHANG Ming-ming, GONG Chun-zhi, TIAN Xiu-bo. Treatment of Inner Surface of Guide Sleeve with Inner Diameter of 20mm(1): Characteristics of Argon Hollow Cathode Discharge [J]. VACUUM, 2020, 57(2): 53-57.
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