VACUUM ›› 2021, Vol. 58 ›› Issue (4): 6-11.doi: 10.13385/j.cnki.vacuum.2021.04.02
• Thin Film • Previous Articles Next Articles
LI Jing1, TAN Zhang-hua2, LIU Xing-xing1, CHEN Ying-lin1, LI Hao-wen2, YANG Hao3, WANG Chang-lin2, WANG Jiang-yong1, XU Cong-kang1
CLC Number:
| [1] BOLELLI G, COLELLA A, LUSVARGHI L, et al. TiC-NiCr thermal spray coatings as an alternative to WC-CoCr and Cr3C2-NiCr[J]. Wear, 2020, 450-451(6): 203-273. [2] BELI [3] AKAZI I H, WILD P M, MOORE T N, et al.The electromechanical behavior of nichrome(80/20wt.%)film[J]. Thin Solid Films, 2003, 433(1-2): 337-34. [4] HOFMANN S.Atomic mixing, surface roughness and information depth in high resolution AES depth profiling of a GaAs/AlAs superlattice structure[J]. Surface and Interface Analysis, 1994, 21(9): 673-678. [5] KIRCHHOFF W H, CHAMBERS G P, FINE J.An analytical expression for describing Auger sputter depth profile shapes of interfaces[J]. Vac.Sci.Technol, 1986, A4: 1666-1670. [6] KIRCHHOFF W H.Logistic function profile fit: a least-squares program for fitting interface profiles to an extended logistic function[J]. Vac.Sci.Technol, 2012, A30: 051-101. [7] DOWSETT M G, BARLOW R D, ALLEN P N.Secondary ion mass spectrometry analysis of ultrathin impurity layers in semiconductors and their use in quantification, instrumental assessment, and fundamental measurements[J]. Vac.Sci.Technol, 1994, B12: 186-198. [8] DOWSETT M G, ROWLANDS G, BARLOW R D, et al.An analytic form for the SIMS response function measured form ultra-thin impurity layers[J]. Surface and Interface Analysis, 1994, 21: 310-315. [9] HOFMANN S.Compositional depth profiling by sputtering[J]. Prog.Surf.Sci, 1991, 36: 35-87. [10] HOFMANN S.Cascade mixing limitations in sputter profiling[J]. Vac.Sci.Technol, 1992, B10: 316-322. [11] HOFMANN S.Sputter depth profiling: past, present, and future[J]. Surface and Interface Analysis, 2014, 46(10-11): 654-662. [12] 康红利, 简玮, 韩逸山, 等. 溅射深度剖析定量分析及其应用研究进展[J]. 汕头大学学报(自然科学版), 2016, 31(2): 3-24. [13] 刘毅, 王江涌. 择优溅射对深度剖析谱和深度分辨率的影响[J]. 真空, 2013(1): 22-26. [14] HOFMANN S, LIU Y, WANG J Y, et al.Analytical and numerical depth resolution function in sputter profiling[J]. Applied Surface Science, 2014, 314(30): 942-955. [15] HOFMANN S.Ultimate depth resolution and profile reconstruction in sputter profiling with AES and SIMS[J]. Surface and Interface Analysis, 2000, 30(1): 228-236. [16] HO P S, LEWIS J E.Deconvolution method for composition profiling by Auger sputtering technique[J]. Surface Science, 1976, 55(1): 335-348. [17] LIAN S Y, WANG Z J, WANG C L, et al.Deconvolution method for obtaining directly the original in-depth, distribution of composition from measured sputter depth profile[J]. Vacuum, 2019, 166(5): 196-200. [18] KOVA [19] ZALAR A, PRA |
| [1] | GAO Peng, BAN Chao, REN Shao-peng, JIN Xiu, WANG Zhong-lian, YANG Wen-hua. An Optimization for Optical Coating Design Based on Genetic Algorithm [J]. VACUUM, 2021, 58(2): 27-30. |
|