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VACUUM ›› 2021, Vol. 58 ›› Issue (5): 50-56.doi: 10.13385/j.cnki.vacuum.2021.05.08

• Thin Film • Previous Articles     Next Articles

Study on Electrochromic Properties of Tungsten Oxide Films Deposited by Medium Frequency Magnetron Sputtering

WEI Meng-yao1,2, WANG Hui1, HAN Wen-fang1,2, WANG Hong-li2, SU Yi-fan2, TANG Chun-mei2, DAI Ming-jiang2, SHI Qian2   

  1. 1. South China University of Technology,School of Materials Science and Engineering,Guangdong Key Laboratory of Advanced Energy Storage Materials,Guangzhou,510640;
    2. Guangdong Academy of Sciences,Guangdong Institute of New Materials,National Engineering Laboratory for Modern Surface Engineering Technology,Guangdong Key Laboratory of Modern Surface Engineering Technology,Guangzhou 510651,China
  • Received:2020-10-12 Online:2021-09-25 Published:2021-09-23

Abstract: The tungsten oxide(WO3) films on transparent conductive indium oxide glass were prepared by mid-frequency magnetron sputtering technique.The effect of sputtering pressure on the microstructure and optical properties of WO3 thin films was studied.The composition and surface morphology of WO3 films were analyzed by X-ray diffraction analysis and scanning electron microscopy.The electrochromic voltammetry,light modulation and cycle life of the WO3 films were studied by electrochemical workstation and UV-Vis spectrophotometer.The chemical composition and oxidation state of WO3 film in the state of coloring and bleaching were analyzed by X-ray photoelectron spectroscopy.The results show that the WO3 films are all amorphous.With the increase of sputtering pressure,the morphology of WO3 films structure becomes loose and rough,which is in favor of the intercalation/de-intercalation of Li+.The films deliver the fast response speed,wide amplitude modulation and excellent electrochromic performance,however,the poor cycling stability.When the sputtering pressure is 4Pa,the best electrochromic properties with the modulation amplitude of 81.0% at 550nm and coloring/bleaching response time of 7.8s/5.85s were obtained,which were well maintained after 1500 cycles.

Key words: WO3 thin film, mid-frequency magnetron sputtering, electrochromism, sputtering pressure, cycle lifetime

CLC Number: 

  • TB34
[1] PORQUERAS I, BERTRAN E.Efficiency of Li doping on electrochromic WO3 thin films[J]. Thin solid films, 2000, 377-378(1): 129-133.
[2] DONG D M, WANG W W, DONG G B, et al.Electrochromic properties of NiOx: H films deposited by dc magnetron sputtering for ITO/NiOx: H/ZiO2/WO3/ITO device[J]. Applied surface science, 2015, 357: 799-805.
[3] 冯志鹏. 磁控溅射WO3薄膜电致变色性能研究[D]. 北京: 北京有色金属研究总院, 2015.
[4] FAUGHNAN B W, CRANDALL R S, LAMPERT M A.Model for the bleaching of WO3 electrochromic films by an electric field[J]. Applied Physics Letters, 1975, 27(5): 275-277.
[5] GESHEVA K A, IVANOVA T, BODUROV G K.APCVD transition metal oxides-functional layers in “Smart windows”[J]. Surface and Coatings Technology, 2007, 201: 9378.
[6] Kharade R R, Mane S R, Mane R M.Synthesis and characterization of chemically grown electrochromic tungsten oxide[J]. Journal of Sol-Gel Science and Technology, 2010, 56(2): 177.
[7] MOULIK S R, SAMANTA S, GHOSH B.Photoresponse in thin films of WO3 grown by pulsed laser deposition[J]. Applied Physics Letters, 2014, 104(23): 232107.
[8] DOBROMIR M, APETREI R P, REBEGEA S, et al.Synthesis and characterization of rf sputtered WO3/TiO2 bilayers[J]. Surface and Coatings Technology, 2016, 285.
[9] SUBRAHMANYAM A, KARUPPASAMY A.Optical and electrochromic properties of oxygen sputtered tungsten oxide(WO3)thin films[J]. Solar Energy Materials and Solar Cells, 2006, 91(4): 266.
[10] OKA N, WATANABE M, SUGIE K, et al.Reactive-gas-flow sputter deposition of amorphous WO3 films for electrochromic devices[J]. Thin solid films, 2013, 532(15): 1-6.
[11] SUN X L, LIU Z M, CAO H T.Effects of film density on electrochromic tungsten oxide thin films deposited by reactive dc-pulsed magnetron sputtering[J]. Journal of Alloys and Compounds, 2010, 504(1): S418-S421.
[12] 冯志鹏, 魏峰, 赵鸿滨, 等. 射频磁控溅射WO3薄膜电致变色性能研究[J]. 稀有金属, 2016, 40(9): 902-907.
[13] 刘晓慧, 薛伟, 夏庆成, 等. 磁溅射法制备TiO2/PTFE复合膜及其性能研究[J]. 装备环境工程, 2016, 13(6): 15-22.
[14] 袁广中. 电致变色氧化钨纳米晶复合薄膜的制备、结构与性能研究[D]. 杭州: 浙江大学, 2018.
[15] 代强, 刘静, 汪洪. 反应磁控溅射氧化钨电致变色薄膜结构与性能[J]. 硅酸盐学报, 2018, 46(7): 978-986.
[16] 裴慧霞, 王玉梅, 高艳平, 等. 射频磁控溅射制备非晶WO3薄膜的结构及其光电性质研究[J]. 半导体光电, 2018, 39(6): 832-835.
[17] 刘洋. WO3电致变色薄膜的制备及性能研究[D]. 北京: 北京交通大学, 2018.
[18] 夏翥杰, 张治国, 王红莉, 等. WO3薄膜制备及其电致变色性能研究[J]. 真空, 2020, 57(2): 47-52.
[19] BUSSOLOTTI F, LOZZI L, PASSACANTANDO M, et al. Surface electronic properties of polycrystalline WO3 thin films: a study by core level and valence band photoemission[J]. Surface Science, 2003, 538(1-2)113-123.
[20] YONGHONG Y E, ZHANG J Y, GU P F, et al.Study on the WO3 dry lithiation for all-solid-state electrochromic devices[J]. Solar Energy Materials and Solar Cells, 1997, 46(4): 349-355.
[21] Zhang J, Tu J P, Xia X H, et al.An all-solid-state electrochromic device based on NiO/WO3 complementary structure and solid hybrid polyelectrolyte[J]. Solar Energy Materials and Solar Cells, 2009, 93(10): 1840-1845.
[22] DEEPA M, SINGH D P, SHIVAPRASAD S M, et al.A comparison of electrochromic properties of sol-gel derived amorphous and nanocrystalline tungsten oxide films[J]. Current Applied Physics, 2007, 7(2): 220-229.
[23] OZKAN E, LEE S H, TRACY C E, et al.Comparison of electrochromic amorphous and crystalline tungsten oxide films[J]. Solar energy materials and solar cells, 2003, 79(4): 439-448.
[24] XIAO L L, LV Y, DONG W J, et al.Dual-functional WO3 nanocolumns with broadband antireflective and high-performance flexible electrochromic properties[J]. ACS Applied Materials & Interfaces, 2016, 8(40): 27107-27114.
[25] KATTOUF B, EINELI Y, SIEGMANN A, et al.Hybrid mesostructured electrodes for fast-switching proton-based solid state electrochromic devices[J]. Journal of Materials Chemistry C, 2013, 1(1): 151-159.
[26] HUANG H, TIAN J, ZHANG W K, et al.Electrochromic properties of porous NiO thin film as a counter electrode for NiO/WO3complementary electrochromic window[J]. Electrochimica acta, 2011, 56(11): 4281-4286.
[27] 初文静, 张喜强, 施瑕玉, 等. 磁控溅射法制备氧化钨薄膜的膜层微观结构对电致变色性能的影响[J]. 激光与光电子学进展, 2017, 54(11): 456-463.
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