基于ANSYS的MEMS离子源测试用高真空腔设计与分析*

doi:10.13385/j.cnki.vacuum.2022.03.04

Abstract

Abstract: A high vacuum chamber suitable for MEMS ion source testing was designed. According to the current research on the high vacuum chamber used for mass spectrometry test, in view of the high vacuum acquiring ability, maintaining ability and the convenience of frequent use, and considering the structural strength, inner wall exhaust and other factors, the cylinder structure which can meet the requirements of both strength and low exhaust rate was selected. Based on ANSYS software, the structural stability and dangerous point distribution of the chamber under high vacuum were analyzed comprehensively. The optimized selection range of wall thickness was determined. This study can provide a theoretical basis for the design of high vacuum chamber.

Key words: ANSYS, high vacuum chamber, outgassing, MEMS ion source

CLC Number:

TB79

ZHOU Yuan, RAN Ao, WU Yi-heng, XIE Yuan-hua, LIU Kun. Design and Analysis of High Vacuum Chamber for MEMS Ion Source Testing Based on ANSYS[J].VACUUM, 2022, 59(3): 16-19.

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Design and Analysis of High Vacuum Chamber for MEMS Ion Source Testing Based on ANSYS

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