VACUUM ›› 2026, Vol. 63 ›› Issue (2): 27-34.doi: 10.13385/j.cnki.vacuum.2026.02.04
• Vacuum Technology Application • Previous Articles Next Articles
LIU Zhipeng1,2, MENG Xiancai2, *, LI Xu2, ZHANG Dehao2, WANG Xiaolong1,2, LIANG Lizhen2,3
CLC Number: TL503.4
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