Abstract: Sputter depth profiling has been widely used to characterize the depth distribution of elements in thin films. However, the complex sputtering process involved and the diversity of sample morphology may interfere with the accuracy of analysis. Aiming at the problem, the thin films depth profiling is briefly introduced firstly. Then, the physical backgrounds of the quantitative depth profiling and the expansion for the quantitative analysis of high-resolution depth profiling data are presented. A depth profiling quantitative analysis software based on the C# programming language is developed, the modules of the software is introduced in detail, and the specific implementation of the software written in C# is demonstrated. The software utilizes an MRI model and integrates functions for the transformation, convolution, and deconvolution of in-depth analysis data, which is capable of performing quantitative analysis on data from micro-area analysis techniques such as SIMS, AES, and XPS. Through optimized algorithms, the software achieves high-precision calculation of the depth resolution function. Users can input experimental data through an intuitive interface, and the software will automatically process the data and generate visual results. This software provides a convenient and efficient tool for general users, significantly enhancing the operability and accuracy of thin film depth profiling quantitative analysis.

Key words: quantitative depth profiling, MRI model, convolution, deconvolution, software