VACUUM ›› 2023, Vol. 60 ›› Issue (1): 17-22.doi: 10.13385/j.cnki.vacuum.2023.01.03
• Thin Film • Previous Articles Next Articles
MA Ze-qin1, LI Hai-ming2, ZHUANG Miao-xia2, LI Ting-ting1, LI Zhen-zhou2, JIANG Jie1, LIAN Song-you1, WANG Jiang-yong1,3, XU Cong-kang1,3
CLC Number:
| [1] 康红利, 劳珏斌, 刘毅, 等. SIMS溅射深度剖析的定量分析[J]. 真空, 2015, 52(2): 44-49. [2] 康红利, 简玮, 韩逸山, 等. 溅射深度剖析定量分析及其应用研究进展[J]. 汕头大学学报(自然科学版), 2016, 31(2): 3-24. [3] 杨浩, 马泽钦, 蒋洁, 等. 辉光放电发射光谱高分辨率深度谱的定量分析[J]. 材料研究与应用, 2021, 15(5): 474-485. [4] 梁家伟, 韩逸山, 庄素娜, 等. 辉光放电发射光谱在材料成分-深度分析中的应用[J]. 真空, 2017, 54(5): 39-46. [5] 梁家伟, 林晓琪, 毕焰枫, 等. 不同工作参数下Ni/Ag双层膜GDOES深度谱的比较[J]. 真空, 2018, 55(2): 5-9. [6] BER B, BÁBOR P, BRUNKOV P N, et al. Sputter depth profiling of Mo/B4C/Si and Mo/Si multilayer nanostructures: a round-robin characterization by different techniques[J]. Thin Solid Films, 2013, 540: 96-105. [7] BELENGUER P, GANCIU M, GUILLOT P, et al.Pulsed glow discharges for analytical applications[J]. Spectrochimica Acta Part B, 2009, 64(7): 623-641. [8] WIKE M, TEICHERT G, GEMMA R, et al.Glow discharge optical emission spectroscopy for accurate and well resolved analysis of coating and thin films[J]. Thin Solid Films, 2011, 520(5): 1660-1667. [9] 周刚, 吕凯, 刘远鹏, 等. 柔性功能薄膜辉光光谱深度分辨率分析[J]. 真空, 2020, 57(4): 1-5. [10] GREHL T, MOLLERS R, NIEHUIS E. Low energy dual beam depth profiling: influence of sputter and analysis beam parameters on profile performance using TOF-SIMS[J]. Applied Surface Science, 2003, 203/204: 277-280. [11] BAEK J Y, CHOI C M, LEE S J, et al.ToF-SIMS of OLED materials using argon gas cluster ion beam: a promising approach for OLED inspection[J]. Applied Surface Science, 2020, 507: 144887. [12] GAJOS K, BUDKOWSKI A, PETROU P, et al.A perspective on ToF-SIMS analysis of biosensor interfaces: controlling and optimizing multi-molecular composition, immobilization through bioprinting, molecular orientation[J]. Applied Surface Science, 2022, 594: 153439. [13] CORNETTE P, ZANNA S, SEYEUX A, et al.The native oxide film on a model aluminium-copper alloy studied by XPS and ToF-SIMS[J]. Corrosion Science, 2020, 174: 108837. [14] KUMAR N, KOZAKOV A T, NEZHDANOV A V, et al.Quantum confinement effect in a nanoscale Mo/Si multilayer structure[J]. The Journal of Physical Chemistry C, 2020, 124(32): 17795-17805. [15] YAMAGUCHI T, IKUTA H, TOMOFUJI T, et al.Reflective properties of Mo/Si multilayer for EUV lithography deposited by the magnetron sputtering device with superconducting bulk magnets[J]. Physica C: Superconductivity, 2008, 468(15/20): 2170-2173. [16] ANDREEV S S, GAPONOV S V, GUSEV S A, et al.The microstructure and X-ray reflectivity of Mo/Si multilayers[J]. Thin Solid Films, 2002, 415(1/2): 123-132. [17] SCHLATMANN R, KEPPEL A, XUE Y, et al.Enhanced reflectivity of soft X-ray multilayer mirrors by reduction of Si atomic density[J]. Applied Physics Letters, 1993, 63(24), 3297-3299. [18] HOFMANN S.Atomic mixing, surface roughness and information depth in high-resolution AES depth profiling of a GaAs/AlAs superlattice structure[J]. Surface and Interface Analysis, 1994, 21(9): 673-678. [19] ZIEGLER J F, BIERSACK JP, LITTMARK U.The stopping range of ions in solids[M]. NewYork: Pergamon Press, 1985. [20] HOFMANN S.Characterization of nanolayers by depth sputter depth profiling[J]. Applied Surface Science, 2005, 241(1/2): 113-121. [21] SEAH M P, LEA C.Depth resolution in composition profiles by ion sputtering and surface analysis for single-layer and multilayer structures on real substrates[J]. Thin Solid Films, 1981, 81(3): 257-270. [22] KANG H, LAO J B, LI Z P, et al.Reconstruction of GaAs/AlAs supperlattice multilayer structure by quantification of AES and SIMS sputter depth profiles[J]. Applied Surface Science, 2016, 388: 584-588. [23] WANG J Y, HOFMANN S, ZALAR A, et al.Quantitative evaluation of sputtering induced surface roughness in depth profiling of polycrystalline multilayers using Auger electron spectroscopy[J]. Thin Solid Films, 2003, 444(1/2): 120-124. [24] LIAN S Y, WANG Z J, WANG C L, et al.Deconvolution method for obtaining directly the original in-depth, distribution of composition from measured sputter depth profile[J]. Vacuum, 2019, 166(5): 196-200. [25] 李静, 谭张华, 刘星星, 等. 利用遗传算法定量分析 Ni/Cr 多层膜俄歇深度谱[J]. 真空, 2021, 58(4): 6-11. [26] WANG C L, LI J, LIU X X, et al.Optimization of the two parameters in the deconvolution procedure for obtaining the original in-depth distribution of composition from measured sputter depth profile by genetic algorithm[J]. Vacuum, 2021, 184: 109866. [27] ASTM. Standard terminology relating to surface analysis: ASTM E673-03[S]. Philadelphia: American Society for Testing and Materials, 2003. |
| [1] | LI Jing, TAN Zhang-hua, LIU Xing-xing, CHEN Ying-lin, LI Hao-wen, YANG Hao, WANG Chang-lin, WANG Jiang-yong, XU Cong-kang. Quantitative Analysis of AES Depth Profiles for Ni/Cr Multilayered Film by Genetic Algorithms [J]. VACUUM, 2021, 58(4): 6-11. |
| [2] | ZHOU Gang, LV Kai, LIU Yuan-peng, YU Yun-peng, XU Cong-kang, WANG Jiang-yong. GDOES Depth Resolution Analysis of Flexible Functional Film [J]. VACUUM, 2020, 57(4): 1-5. |
|