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VACUUM ›› 2026, Vol. 63 ›› Issue (2): 61-67.doi: 10.13385/j.cnki.vacuum.2026.02.09

• Vacuum Acquisition System • Previous Articles     Next Articles

A Brief Review of Vacuum Technology in EUV Lithography

LI Xiaojin, SUN Wenjun, MA Ben, DONG Meng, ZHAO Lan, PEI Xiaoqiang, LI Zhengqing, MA Fengying   

  1. Lanzhou Institute of Physics, Lanzhou 730000, China
  • Received:2025-02-18 Online:2026-03-25 Published:2026-03-27

Abstract: EUV lithography is also called extreme ultraviolet lithography, which uses extreme ultraviolet light with a wavelength of 13.5 nm as the light source. Extreme ultraviolet light is easily absorbed by many materials, including air, so EUV lithography can only operate in vacuum environment. At the same time, EUV lithography has special requirements for vacuum system. In particular, vacuum system with good compatibility plays important impact on improving the life and yield of the EUV lithography. This paper reviews the acquisition of the specific vacuum environment in the main chambers, design of compatibility, influence of vacuum system materials on the quality of lithography, and the methods of contamination monitoring in the vacuum environment of the EUV lithography through the vacuum technology involved in the key architecture and process of the EUV lithography.

Key words: EUV lithography, vacuum technology, compatibility design, contamination monitoring

CLC Number:  TN305.7

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