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VACUUM ›› 2024, Vol. 61 ›› Issue (3): 110-112.doi: 10.13385/j.cnki.vacuum.2024.03.20

• Lectures on Vacuum Technology and Its Application • Previous Articles     Next Articles

No. 22:Chemical Vapor Deposition Technology

ZHANG Yi-chen   

  • Published:2024-06-04

CLC Number:  O484;TB43

[1] LI Can-min, DONG Zhong-lin, XIA Zheng-wei, ZHANG Xin-feng, WEI Rong-hua. Microstructure and Properties of TiCr-based Nanocomposite Coatings by Plasma Enhanced Magnetron Sputtering [J]. VACUUM, 2024, 61(2): 10-15.
[2] . [J]. VACUUM, 2024, 61(2): 86-88.
[3] . [J]. VACUUM, 2024, 61(1): 87-88.
[4] WU Xiao-hu, HU Shu-jie, SUN En-ze, ZHANG Xin, ZHAO Qi. Performance Regulation Approach of Fluorinated Amorphous Carbon Film for Large-space Building [J]. VACUUM, 2023, 60(6): 42-46.
[5] ZHANG Yi-chen. No. 22:Chemical Vapor Deposition Technology [J]. VACUUM, 2023, 60(6): 87-88.
[6] . [J]. VACUUM, 2023, 60(5): 102-104.
[7] . [J]. VACUUM, 2023, 60(4): 85-88.
[8] YU Kang-yuan, HE Yu-dan, YANG Bo, LUO Jiang-shan. Effect of Sputtering Voltage on Microstructure and Properties of Cu Foils Deposited by High Power Impulse Magnetron Sputtering [J]. VACUUM, 2023, 60(3): 1-4.
[9] ZHU Jian-hua, PAN Jing, YUE Jian-ming, HAO Li-ping, ZHI Peng-wei, JIA Zhe. Structure and Luminescence Properties of Zn1-xSbxO Films Grown at Different Temperatures [J]. VACUUM, 2023, 60(3): 18-23.
[10] XIANG Yu-chun, ZHU Jian-lei, YUAN Ya. Effect of Oxygen Pressure on the Properties of CuO Films Grown by Pulse Laser Deposition [J]. VACUUM, 2023, 60(3): 42-45.
[11] . [J]. VACUUM, 2023, 60(3): 86-88.
[12] ZHANG Han-yan, ZHENG Dan-xu, SHEN Yi, CHEN Yu-yun. Research of Insulation of Silicon Oxide Film Produced by Medium Frequency Magnetron Sputtering [J]. VACUUM, 2023, 60(2): 34-38.
[13] . [J]. VACUUM, 2023, 60(2): 86-88.
[14] . [J]. VACUUM, 2023, 60(1): 86-88.
[15] LIU Qi, XU Jun-qi, SU Jun-hong, HAN Gang, LI Yang, YUAN Song-song. Study on Gradient Index Films Prepared by Thermal Evaporation Technology [J]. VACUUM, 2022, 59(6): 22-28.
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