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VACUUM ›› 2025, Vol. 62 ›› Issue (4): 75-80.doi: 10.13385/j.cnki.vacuum.2025.04.14

• Thin Film • Previous Articles     Next Articles

Influence of Mask Blanks Sputtering Process on the Adhesion Between Chromium Film and Glass Substrate

LI Yi, LI Wei, XU Gen, YANG Xu   

  1. Hunan Puzhao Information Materials Co., Ltd., Changsha 410006, China
  • Received:2024-08-23 Online:2025-07-25 Published:2025-07-24

Abstract: To improve the adhesion between the chromium film layer of the mask substrate and the glass substrate, three layers of chromium film were fabricated on the Q6025 quartz glass substrate by magnetron sputtering. Two adhesion monitoring methods were used to study the effects of substrate temperature, sputtering atmosphere and annealing treatment on the adhesion of chromium film layer and substrate, while SEM was utilized to characterize and analyze the microstructure of the chromium film layers sputtered under different glass substrate heating temperatures and mixed atmospheres. The results show that heating the glass substrate to 160 ℃ leads to a better adhesion between the chromium film layer and the glass substrate. In addition, the microstructure of the chromium film layer produced in the mixed atmosphere consists of 50-60 nm pure chromium particles and 10-20 nm chromium oxynitride particles, which enhances the adhesion between the chromium film layer and the glass substrate. The annealing temperature of 300 ℃ and the holding time of 1 h further optimize the adhesion between the chromium film and the glass substrate.

Key words: mask blank, adhesion force, sputtering atmosphere, annealing

CLC Number:  TB741

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