VACUUM ›› 2025, Vol. 62 ›› Issue (2): 62-67.doi: 10.13385/j.cnki.vacuum.2025.02.10
• Thin Film • Previous Articles Next Articles
SUN Bingcheng, ZHANG Xianwang, ZHANG Jian
CLC Number: TB34
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[2] | ZHANG Jian, LI Jian-hao, QI Zhen-hua. Effect of Process Parameters on SiC Film Properties under DC Magnetron Sputtering [J]. VACUUM, 2022, 59(4): 52-55. |
[3] | ZHU Bei-bei, NI Chang, QIN Lin, CHU Jian-ning, CHEN Xiao, XU Jian-feng. Nano Film Deposition Technology Based on Magnetron Sputtering [J]. VACUUM, 2021, 58(6): 21-26. |
[4] | ZHANG Jian, NIU Xia-bin, LI Jian-hao, QI Zhen-hua. Effect of RF Power and Sputtering Pressure on Al Film Sputtered on Polythylene Terephthalate Substrates [J]. VACUUM, 2021, 58(4): 21-24. |
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[6] | WU Xing, JIANG Ai-hua, CHENG Yong. Effect of RF Power on Structure and Mechanical Properties of DLC Films [J]. VACUUM, 2019, 56(4): 34-36. |
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