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VACUUM ›› 2020, Vol. 57 ›› Issue (2): 47-52.doi: 10.13385/j.cnki.vacuum.2020.02.09

• Thin Film • Previous Articles     Next Articles

Preparation and Electrochromic Properties of WO3 Thin Films

XIA Zhu-jie1,2, ZHANG Zhi-guo1, WANG Hong-li2, SU Yi-fan2, TANG Peng2, LIN Song-sheng2, DAI Jiang-ming2, SHI Qianb2   

  1. 1.Institute of Advanced Wear and Corrosion Resistant and Functional Materals, Jinan University, Guangzhou 510632, China;
    2.National Engineering Laboratory for Modern Materials Surface Engineering Technology, The Key Lab Guangdong for Modern Surface Engineering, Guangdong Institute of New Materials, Guangzhou 510651, China
  • Received:2019-07-02 Online:2020-03-25 Published:2020-04-24

Abstract: The WO3 thin film was prepared at room temperature by using a DC reactive magnetron sputtering method. The effects of sputtering power on the structure and electrochromic properties of the WO3 thin films were investigated. The structural evolution and electrochromic properties of WO3 films after annealing were investigated. The results show that the WO3 film exhibits better electrochromic performance at a sputtering power of 270 W, with a modulation amplitude of 78.5%, coloring time of 9s and fading time of 3.2s. The WO3 film prepared at this power is annealed, and its structure changes from amorphous to crystalline, but the modulation amplitude and response time characteristics are degraded to some extent. It is known that the amorphous WO3 film has faster response time and wider modulation amplitude than the crystalline structure, but the crystalline film has better cycle stability.

Key words: WO3 thin film, amorphous state, electrochromic properties, cyclic stability

CLC Number: 

  • TB34
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