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VACUUM ›› 2020, Vol. 57 ›› Issue (4): 72-76.doi: 10.13385/j.cnki.vacuum.2020.04.15

• Vacuum Technology Application • Previous Articles     Next Articles

Study on Characteristics of Plasma Polished Quartz Glass

ZHENG Cai-guo1,2, CHEN Qing-chuan1, NIE Jun-wei1, LI Min-jiu1, CHEN Mei-yan1   

  1. 1. Southwestern Institute of Physics, Chengdu 610041, China;
    2. The Engineering and Technical College of Chengdu University of Technology, Leshan 614007, China
  • Received:2019-06-17 Online:2020-07-25 Published:2020-07-23

Abstract: Ion beam has the advantages of high machining accuracy, good controllability, clean and pollution-free processing surface, etc. Using ion beam to fabricate ultra-smooth optical elements can avoid the subsurface damage caused by traditional machining methods. In this paper, RF plasma was applied for processing of quartz glass, and the polishing effect of RF plasma was studied. The influence of process parameters such as ion beam energy, beam density and angle of incidence on the polishing effect was analyzed. The test results show that the surface roughness RMS first decreased and then increased with the increase of ion beam energy. When the ion beam polishing energy was 600eV, the roughness reached the minimum of 1.73RMS/nm, and when the ion beam beam was 200mA, the roughness reached the minimum of 1.26RMS/nm. As the polishing time increases, the surface roughness decreases and then increases.

Key words: ion beam polishing, angle of incidence, RF ion source, surface roughness

CLC Number: 

  • TP391
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