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VACUUM ›› 2026, Vol. 63 ›› Issue (1): 15-21.doi: 10.13385/j.cnki.vacuum.2026.01.03

• Thin Film • Previous Articles     Next Articles

Study on the Influence of Various Preparation Methods on the Properties of TiN Coatings

YU Lei, TIAN Junrui, CAO Lei, CAO Zhiqiang   

  1. Beijing NAURA Vacuum Technology Co., Ltd., Beijing 100015, China
  • Received:2024-11-01 Online:2026-01-25 Published:2026-02-02

Abstract: Physical vapor deposition, as a clean and efficient coating method, is considered to be the best choice for preparing ceramic coatings. Different preparation methods influence the structure and performance of the film. In this paper, TiN coatings were prepared by high-power pulsed magnetron sputtering (HiPIMS) technology and self-developed composite magnetic field arc ion plating (AIP), and the microstructure, mechanical properties, friction performance, and electrochemical corrosion behavior of the coatings were studied. The results show that the coating prepared by HiPIMS is more denser and the nano-hardness is 30.8 GPa. The polarization resistance of the coating deposited by HiPIMS is about one order of magnitude higher than that of AIP film under the same test conditions. The AIP coating shows higher elastic modulus of 575.5 GPa, and the lowest friction coefficient of the coating under atmospheric conditions is 0.42.

Key words: AIP, HiPIMS, friction property, corrosion resistance, electrochemistry

CLC Number:  TB34

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