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VACUUM ›› 2022, Vol. 59 ›› Issue (5): 1-6.doi: 10.13385/j.cnki.vacuum.2022.05.01

• Thin Film •     Next Articles

Preparation and Properties of Zr55Cu30Al10Ni5 Amorphous Thin Films

XIN Xian-feng1, LIU Lin-gen1, LIN Guo-qiang1, DONG Chuang1,2, DING Wan-yu2, ZHANG Shuang2, WANG Qi-zhen2, LI Jun2, WAN Peng3   

  1. 1. Dalian University of Technology, Dalian 116024, China;
    2. Dalian Jiaotong University, Dalian 116028, China;
    3. Foshan Shunde Midea Electrical Heating Appliances Manufacturing Co., Ltd., Foshan 528300, China
  • Received:2021-11-15 Online:2022-09-25 Published:2022-09-28

Abstract: Amorphous alloy films have been widely investigated because of their excellent properties such as non-stick and corrosion resistance, which are especially prominent for bulk-metallic-glass-forming Zr55Cu30Al10Ni5 composition. In this work, amorphous alloy films are prepared by magnetron sputtering using Zr55Cu30Al10Ni5 bulk metallic glass as the target. The effects of different sputtering power on the mechanical properties, non-stick, corrosion resistance and surface roughness of the films were studied. The results show that high-quality amorphous films, as evaluated by mechanical properties, non-stick, and corrosion resistance, can be obtained at a magnetron sputtering power range from 75W to 165W, with hardness of ~9.2GPa, modulus of elasticity of ~164GPa, hardness-to-elasticity ratio of ~0.055, self-corrosion current density of ~1.16μA·cm-2, self-corrosion potential of -241.27mV, and the maximum wetting angle of 104°. Such data are generally comparable with the reported ones（the hardness is even higher）, confirming a good potential for non-stick and corrosion resisting purposes.

Key words: Zr-based amorphous alloy, thin film, magnetron sputtering, non-stick, corrosion resistance

CLC Number: 

  • TG174.4
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