VACUUM ›› 2020, Vol. 57 ›› Issue (4): 72-76.doi: 10.13385/j.cnki.vacuum.2020.04.15
• Vacuum Technology Application • Previous Articles Next Articles
ZHENG Cai-guo1,2, CHEN Qing-chuan1, NIE Jun-wei1, LI Min-jiu1, CHEN Mei-yan1
CLC Number:
[1] 周永恒. 透明石英玻璃原料及其加工[J]. 非金属矿, 2000, 23(2): 32, 34. [2] 李娜, 蒋威, 李亚国. 石英玻璃抛光表面层性质探索[J]. 激光杂志, 2013, (4): 38-39. [3] 刘德福, 陈涛, 陈广林, 等. 软性粒子抛光石英玻璃的材料去除机理[J]. 光学精密工程, 2016, (7): 1623-1631. [4] 王仲杰, 王胜利, 王辰伟, 等. 超精度石英玻璃的化学机械抛光[J]. 微纳电子技术, 2017, (1): 48-52. [5] 王洪祥, 朱本温, 王景贺, 等. 熔石英元件抛光加工亚表面缺陷的检测[J]. 材料科学与工艺, 2015, (2): 8-12. [6] 杜秀蓉, 张晓强, 王慧, 等. 抛光石英玻璃亚表面缺陷研究[J]. 硅酸盐通报. 2017(A1): 47-49, 77. [7] 于吉鲲. 等离子抛光技术的原等理及应用[J]. 机械工程师, 2016, (5): 46-47. [8] 苏志伟, 陈庆川, 冯春堂, 等. K9玻璃的离子束抛光[A]. 2006全国荷电粒子源粒子束学术会议文集[C]. 2006: 344-347. [9] 段金鑫, 解旭辉, 周林. 光学镜面离子束抛光中的离子源稳定性研究[J]. 航空精密制造技术, 2010, 46(5): 10-13. [10] 万春候. 等离子体离子源物理与技术[M]. 北京: 科学出版社, 1976: 211-276. [11] 王斌. K9光学玻璃化学机械磨削用磨具的研制及性能研究[D]. 大连: 大连理工大学, 2013. [12] 张巨帆, 王波, 董申. 大气等离子体抛光技术在超光滑硅表面加工中的应用[J]. 光学精密工程, 2007, 15(11): 1749-1755. [13] 唐瓦, 邓伟杰, 郑立功, 等. 离子束抛光去除函数计算与抛光实验[J]. 光学精密工程, 2015, (1): 31-39. [14] 潘鑫, 马志斌, 高攀, 等. ECR等离子体刻蚀增强机械抛光CVD金刚石[J]. 真空科学与技术学报, 2015, (2): 174-178. [15] Tonnellier X, Morantz P, Shore P, et al.Subsurface damage in precision ground ULE and Zerodur surfaces[J]. Optics Express, 2007, 15(19): 12197-12205. [16] Xia X, Zheng W G, Yuan X D, et al.Irradiation effects of CO2 laser parameters on surface morphology of fused silica[J]. Chinese Physics B, 2011, 20(4): 536~541. [17] Li L, Xia X, Zu X T, et al.The electric field modulation by three-dimensional crack on fused silica subsurface[J]. Optik, 2011, 122(16): 1423-1425. [18] Li L, Xiang X, Zu X T, et al.Numerical simulation of the modulation to incident laser by the repaired damage site in a fused silica subsurface[J]. Chinese Physics B, 2011, 20(7): 074209. [19] 刘金声. 高速离子铣技术的研究. 微细加工技术, 1985, (2): 10-17. [20] 刘金声. 离子束技术及应用[M]. 北京: 国防工业出版社, 1995. [21] Nikiforov S, Solnyshkov D, Voronin G. Development of an ECR ion source for accelerators and plasma processing applications[EB/OL]. http://epaper. kek. jp/e94/PDF/EPAC1994_1427. PDF. [22] Kökényesi S, Iván I, Takács E, et al.Multipurpose 14. 5GHz ECR ion source: Special features and application for surface modification[J]. Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materids and Atoms[J]. 2005, 233(1-4): 222-226. [23] Taki G S, Chakraborty D K, Chakraborty P S, et al.Performance of a 6.4GHz ECR ion source at VECC[A]. Proceedings of the Second Asian Particle Accelerator Conference[C]. APAC, 2001: 789-790. [24] Lyneis C M.Proceeding of the 13th International Conference on Cyclotrons and their Applications, July 06-10, 1992[C]. Singapore: World Scientific, 1993: 301. [25] Asmussen J.Electron cyclotron resonance microwave discharges for etching and thin film desposition[J]. Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, 1989, 7(3): 883-893. [26] Steinberg G N, Reeinberg A R. Apparatus for the etching for semiconductor devices: US4368092[P].1983-01-11. |
[1] | TIAN Tong-tong, LI Lun, ZHOU Bo, ZHAO Ji-bin, XU Jia-pan. Research on Color Section Contour Generation Algorithm of Texture Mapping Model [J]. VACUUM, 2020, 57(2): 71-77. |
[2] | TIAN Tong-tong, LI Lun, ZHOU Bo, ZHAO Ji-bin. Research on Color 3D Printing Slice Technology [J]. VACUUM, 2019, 56(6): 75-79. |
[3] | ZHENG Lie, LI Hong. Design of 200kV/2mA continuous adjustable DC high voltage generator [J]. VACUUM, 2018, 55(6): 10-13. |
[4] | TIAN Tong-tong, LI Lun, ZHOU Bo, ZHAO Ji-bin. Research on Partition Adaptive Process Adjustment Algorithm in Rapid Prototyping Technology [J]. VACUUM, 2020, 57(3): 80-83. |
|