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VACUUM ›› 2022, Vol. 59 ›› Issue (5): 14-19.doi: 10.13385/j.cnki.vacuum.2022.05.03

• Thin Film • Previous Articles     Next Articles

Study on Thermal Stability of CrCN Films Prepared by FCVAD Technology

WU Shuai1, LIU Shuang1, QIN Li-zhao1, ZHANG Xu2, ZHANG Tong-hua1, LIAO Bin2, WANG Ke-ping3   

  1. 1. Department of Materials and Energy, Southwest University, Chongqing 400715, China;
    2. Key Laboratory of Beam Technology and Material Modification of Ministry of Education, Beijing Normal University,Beijing 100875, China;
    3. Jinmao Textile Equipment Co., Ltd., Chongqing 400715, China
  • Received:2022-01-14 Online:2022-09-25 Published:2022-09-28

Abstract: CrCN films prepared by magnetic filtration cathodic arc deposition(FCVAD)technology have excellent mechanical properties and can be used as surface modified films in textile equipment, pcb drill bits and piston rings. In this paper, the thermal stability of CrCN films was investigated for the situation that the structure and properties of films will change due to high temperature caused by friction or high temperature of application environment. Structure of the films from room temperature to 800℃ was characterized by X-ray diffraction(XRD), field emission scanning electron microscopy(FESEM), Raman spectroscopy(Raman), and X-ray photoelectron spectroscopy(XPS). The results show that the upper limit of thermal stability of CrCN films prepared by FCVAD technique is about 400℃. When the temperature is below 400℃, the structure of CrCN films is stable and remains disordered. When the temperature reaches 500℃, fine grains appear on the surface of the films, and the CrN phase in the films is transformed into Cr2N phase. As the temperature continues to increase, the CrCN solid solution phase starts to graphitize, and the grain size within the films becomes larger. When the temperature is greater than 700℃, carbon in the films leaves in the form of CO or CO2, and Cr element exists in the form of Cr2O3 phase and grows into grains with a size of about 400nm at 800℃.

Key words: FCVAD technology, CrCN thin film, thermal stability

CLC Number: 

  • TG156.21
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