钯金属薄膜制备方法的研究现状与进展*

doi:10.13385/j.cnki.vacuum.2022.05.02

Abstract

Abstract: In recent years, palladium thin films have attracted wide attention due to their excellent properties such as low resistivity and high catalytic activity. Palladium and its alloy thin films have gained more and more interest from researchers in the applications of integrated circuit interconnection, hydrogen sensing, hydrogen storage and catalysis. There are many researches of the preparation of palladium metal film, this article focuses on the research development of preparation of palladium membrane using physical vapor deposition, chemical vapor deposition, atomic layer deposition and plasma auxiliary atomic layer deposition technology, and discusses the pros and cons of various preparation methods, sums up the precursor used to do, and prospects the development trend of preparation technology of palladium film.

Key words: palladium metal film, PVD, CVD, ALD

CLC Number:

TB383

WANG Dong-yuan, ZHOU Tian, CHEN Qiang, LIU Zhong-wei. Research Status and Progress of Preparation Methods of Palladium Thin Films[J].VACUUM, 2022, 59(5): 7-13.

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Research Status and Progress of Preparation Methods of Palladium Thin Films

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