离子溅射仪油雾污染对溅射基底的影响

doi:10.13385/j.cnki.vacuum.2023.04.03

Abstract

Abstract: The effect of oil mist pollution on micromorphology and element content of sputtered substrate(silicon wafer, weighing paper, copper foil and glass slide) was studied through optical microscope, field emission scanning electron microscope, energy spectrometer and atomic force microscope. The results show that after sputtering deposition for different times, spherical particles appear on the silicon substrate, and the particles gather or grow with the increase of sputtering time. The carbon content of silicon wafer before sputtering is 4.55%, and it rises to about 31.55% after 50s of sputtering deposition. The optical morphology of copper foil and weighing paper after sputtering deposition for 50s has little difference from the sample before sputtering, and there is no spherical particle. The optical morphology of glass slide after sputtering deposition for 50s is similar to that of the silicon slide, spherical particles are randomly distributed on the surface. The silicon substrate is extremely sensitive to oil mist pollution, which is characterized by spherical particles distributed on the surface of the sample after sputtering treatment,and the mass fraction of carbon is about 7-8 times of that before sputtering.

Key words: ion sputter instrument, oil mist molecule, substrate, spherical particles

CLC Number: TN16;TB321

PENG Bo, YUAN Qiu, MENG Xiao-min. Influence of Oil Mist Pollution on Sputtering Substrate of Ion Sputtering Instrument[J].VACUUM, 2023, 60(4): 13-17.

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Influence of Oil Mist Pollution on Sputtering Substrate of Ion Sputtering Instrument

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