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VACUUM ›› 2020, Vol. 57 ›› Issue (5): 24-27.doi: 10.13385/j.cnki.vacuum.2020.05.06

• Thin Film • Previous Articles     Next Articles

Effect of Substrate Temperature on the Properties of CuO Films Deposited by Pulse Laser Deposition

XIANG Yu-chun   

  1. Xianyang Vocational & Technical College, Xi’an 710600, China
  • Received:2019-09-18 Published:2020-11-06

Abstract: The CuO thin films were deposited on glass substrates by puls laser deposition and the effects of substrate temperature on the structural, electrical, and optical properties of CuO thin films were investigated. Thin films deposited at different substrate temperature under 8 Pa were all CuO. All CuO thin films exhibited a transmittance higher than 65% in the NIR range. Increasing the substrate temperature to amoderate level(300 in this study)accompanied improved crystalline quality, which yielded the lowest electrical resistivity of 2.33×102Ωcm with the highest carrier concentration of 5.28×10161/cm3 and Hall mobility of 1.26cm2/(VS). The most important is that CuO achieved from p-type to n-type at above 500℃. The n-type characteristics need to be improved to make these films useful for applications like transparent p-n junction based devices.

Key words: CuO, pulse laser deposition, substrate temperature, conduction type, electrical resistivity

CLC Number: 

  • O484
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