等离子抛光石英玻璃特性研究*

doi:10.13385/j.cnki.vacuum.2020.04.15

真空 ›› 2020, Vol. 57 ›› Issue (4): 72-76.doi: 10.13385/j.cnki.vacuum.2020.04.15

等离子抛光石英玻璃特性研究^*

郑才国^1,2, 陈庆川¹, 聂军伟¹, 李民久¹, 陈美艳¹

1.核工业西南物理研究院,四川成都 610041;
2.成都理工大学工程技术学院,四川乐山 614007

收稿日期:2019-06-17 出版日期:2020-07-25 发布日期:2020-07-23
通讯作者: 陈庆川,研究员,博导。
作者简介:郑才国（1977-）,男,重庆市潼南县人,博士生,副教授。
基金资助:
*国家自然科学基金（11475059）; 乐山市重点科技计划项目(19GZD039); 成都理工大学工程技术学院院级基金项目（C122017029）

Study on Characteristics of Plasma Polished Quartz Glass

ZHENG Cai-guo^1,2, CHEN Qing-chuan¹, NIE Jun-wei¹, LI Min-jiu¹, CHEN Mei-yan¹

1. Southwestern Institute of Physics, Chengdu 610041, China;
2. The Engineering and Technical College of Chengdu University of Technology, Leshan 614007, China

Received:2019-06-17 Online:2020-07-25 Published:2020-07-23

摘要/Abstract

摘要： 离子束具有加工精度高、可控性好、加工面洁净无污染等优点,利用其加工超光滑光学元件可避免传统机械加工方法所带来的亚表面损伤。本文将射频等离子体应用于石英玻璃的加工,对射频等离子体抛光效应进行了研究。分析通过改变离子束的能量、束流和入射角等工艺参数,对抛光效果的影响。试验结果表明,表面粗糙度RMS随着离子束能量的增大先降低后升高,离子束抛光能量为600eV时,粗糙度到达最小,为1.73RMS/nm,离子束束流为200mA 时,粗糙度到达最小为1.26RMS/nm。表面粗糙度随抛光时间增加先降低后升高。

关键词: 离子束抛光, 入射角, 射频离子源, 表面粗糙度

Abstract: Ion beam has the advantages of high machining accuracy, good controllability, clean and pollution-free processing surface, etc. Using ion beam to fabricate ultra-smooth optical elements can avoid the subsurface damage caused by traditional machining methods. In this paper, RF plasma was applied for processing of quartz glass, and the polishing effect of RF plasma was studied. The influence of process parameters such as ion beam energy, beam density and angle of incidence on the polishing effect was analyzed. The test results show that the surface roughness RMS first decreased and then increased with the increase of ion beam energy. When the ion beam polishing energy was 600eV, the roughness reached the minimum of 1.73RMS/nm, and when the ion beam beam was 200mA, the roughness reached the minimum of 1.26RMS/nm. As the polishing time increases, the surface roughness decreases and then increases.

Key words: ion beam polishing, angle of incidence, RF ion source, surface roughness

中图分类号:

TP391

郑才国, 陈庆川, 聂军伟, 李民久, 陈美艳. 等离子抛光石英玻璃特性研究^*[J]. 真空, 2020, 57(4): 72-76.

ZHENG Cai-guo, CHEN Qing-chuan, NIE Jun-wei, LI Min-jiu, CHEN Mei-yan. Study on Characteristics of Plasma Polished Quartz Glass[J]. VACUUM, 2020, 57(4): 72-76.

参考文献

[1] 周永恒. 透明石英玻璃原料及其加工[J]. 非金属矿, 2000, 23(2): 32, 34.
[2] 李娜, 蒋威, 李亚国. 石英玻璃抛光表面层性质探索[J]. 激光杂志, 2013, (4): 38-39.
[3] 刘德福, 陈涛, 陈广林, 等. 软性粒子抛光石英玻璃的材料去除机理[J]. 光学精密工程, 2016, (7): 1623-1631.
[4] 王仲杰, 王胜利, 王辰伟, 等. 超精度石英玻璃的化学机械抛光[J]. 微纳电子技术, 2017, (1): 48-52.
[5] 王洪祥, 朱本温, 王景贺, 等. 熔石英元件抛光加工亚表面缺陷的检测[J]. 材料科学与工艺, 2015, (2): 8-12.
[6] 杜秀蓉, 张晓强, 王慧, 等. 抛光石英玻璃亚表面缺陷研究[J]. 硅酸盐通报. 2017(A1): 47-49, 77.
[7] 于吉鲲. 等离子抛光技术的原等理及应用[J]. 机械工程师, 2016, (5): 46-47.
[8] 苏志伟, 陈庆川, 冯春堂, 等. K9玻璃的离子束抛光[A]. 2006全国荷电粒子源粒子束学术会议文集[C]. 2006: 344-347.
[9] 段金鑫, 解旭辉, 周林. 光学镜面离子束抛光中的离子源稳定性研究[J]. 航空精密制造技术, 2010, 46(5): 10-13.
[10] 万春候. 等离子体离子源物理与技术[M]. 北京: 科学出版社, 1976: 211-276.
[11] 王斌. K9光学玻璃化学机械磨削用磨具的研制及性能研究[D]. 大连: 大连理工大学, 2013.
[12] 张巨帆, 王波, 董申. 大气等离子体抛光技术在超光滑硅表面加工中的应用[J]. 光学精密工程, 2007, 15(11): 1749-1755.
[13] 唐瓦, 邓伟杰, 郑立功, 等. 离子束抛光去除函数计算与抛光实验[J]. 光学精密工程, 2015, (1): 31-39.
[14] 潘鑫, 马志斌, 高攀, 等. ECR等离子体刻蚀增强机械抛光CVD金刚石[J]. 真空科学与技术学报, 2015, (2): 174-178.
[15] Tonnellier X, Morantz P, Shore P, et al.Subsurface damage in precision ground ULE and Zerodur surfaces[J]. Optics Express, 2007, 15(19): 12197-12205.
[16] Xia X, Zheng W G, Yuan X D, et al.Irradiation effects of CO₂ laser parameters on surface morphology of fused silica[J]. Chinese Physics B, 2011, 20(4): 536~541.
[17] Li L, Xia X, Zu X T, et al.The electric field modulation by three-dimensional crack on fused silica subsurface[J]. Optik, 2011, 122(16): 1423-1425.
[18] Li L, Xiang X, Zu X T, et al.Numerical simulation of the modulation to incident laser by the repaired damage site in a fused silica subsurface[J]. Chinese Physics B, 2011, 20(7): 074209.
[19] 刘金声. 高速离子铣技术的研究. 微细加工技术, 1985, (2): 10-17.
[20] 刘金声. 离子束技术及应用[M]. 北京: 国防工业出版社, 1995.
[21] Nikiforov S, Solnyshkov D, Voronin G. Development of an ECR ion source for accelerators and plasma processing applications[EB/OL]. http://epaper. kek. jp/e94/PDF/EPAC1994_1427. PDF.
[22] Kökényesi S, Iván I, Takács E, et al.Multipurpose 14. 5GHz ECR ion source: Special features and application for surface modification[J]. Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materids and Atoms[J]. 2005, 233(1-4): 222-226.
[23] Taki G S, Chakraborty D K, Chakraborty P S, et al.Performance of a 6.4GHz ECR ion source at VECC[A]. Proceedings of the Second Asian Particle Accelerator Conference[C]. APAC, 2001: 789-790.
[24] Lyneis C M.Proceeding of the 13th International Conference on Cyclotrons and their Applications, July 06-10, 1992[C]. Singapore: World Scientific, 1993: 301.
[25] Asmussen J.Electron cyclotron resonance microwave discharges for etching and thin film desposition[J]. Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, 1989, 7(3): 883-893.
[26] Steinberg G N, Reeinberg A R. Apparatus for the etching for semiconductor devices: US4368092[P].1983-01-11.

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等离子抛光石英玻璃特性研究^*

Study on Characteristics of Plasma Polished Quartz Glass

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