调制比对电弧离子镀Cr/TiN纳米多层膜力学性能的影响*

doi:10.13385/j.cnki.vacuum.2021.02.03

真空 ›› 2021, Vol. 58 ›› Issue (2): 10-14.doi: 10.13385/j.cnki.vacuum.2021.02.03

调制比对电弧离子镀Cr/TiN纳米多层膜力学性能的影响^*

吴彦超, 刘豫瑶, 刘洋, 高晟元, 黄美东

天津师范大学,物理与材料科学学院,天津 300387

收稿日期:2020-12-02 出版日期:2021-03-25 发布日期:2021-04-09
通讯作者: 黄美东,教授。
作者简介:吴彦超（1995-）,男,河南省济源市人,硕士生。
基金资助:
*天津市大学生创新创业项目（202010065084）

Effects of Modulation Ratio on Mechanical Properties of Cr/TiN Nano-multilayers Prepared by Arc Ion Plating

WU Yan-chao, LIU Yu-yao, LIU Yang, GAO Sheng-yuan, HUANG Mei-dong

College of Physics and Materials Science, Tianjin Normal University, Tianjin 300387, China

Received:2020-12-02 Online:2021-03-25 Published:2021-04-09

摘要/Abstract

摘要： 采用电弧离子镀技术,通过改变调制比沉积Cr/TiN纳米多层膜。利用扫描电子显微镜、原子力显微镜、X射线衍射仪、纳米压痕仪研究了调制比对Cr/TiN纳米多层膜表面形貌、微观结构以及力学性能的影响。结果表明,纳米多层膜表面致密、平滑均匀,膜层与基底结合良好,膜层综合力学性能优异,出现明显的纳米效应和界面效应。当调制比为2∶3时,纳米多层膜的硬度达最大值33.22GPa。

关键词: 电弧离子镀, Cr/TiN纳米多层膜, 硬度, 调制比

Abstract: Cr/TiN nanoscale multilayers were deposited by arc ion plating with different modulation ratios. The surface morphology, microstructure, hardness and adhesion strength to the substrate of the multilayers were investigated by SEM, AFM, XRD and nano-indenter, respectively. The results show that the Cr/TiN nano-multilayers have compact microstructure with smooth surfaces and comprehensively excellent mechanical properties, indicating nano-interface effects exist in the films. The maximum hardness of 33.22GPa was achieved as the modulation ratio of 2∶3 was applied.

Key words: arc ion plating, Cr/TiN nano-multilayers, hardness, modulation ratio

中图分类号:

TB79

吴彦超, 刘豫瑶, 刘洋, 高晟元, 黄美东. 调制比对电弧离子镀Cr/TiN纳米多层膜力学性能的影响^*[J]. 真空, 2021, 58(2): 10-14.

WU Yan-chao, LIU Yu-yao, LIU Yang, GAO Sheng-yuan, HUANG Mei-dong. Effects of Modulation Ratio on Mechanical Properties of Cr/TiN Nano-multilayers Prepared by Arc Ion Plating[J]. VACUUM, 2021, 58(2): 10-14.

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调制比对电弧离子镀Cr/TiN纳米多层膜力学性能的影响^*

Effects of Modulation Ratio on Mechanical Properties of Cr/TiN Nano-multilayers Prepared by Arc Ion Plating

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