半球谐振子金属化镀膜残余应力的测量方法及影响因素研究*

doi:10.13385/j.cnki.vacuum.2022.02.11

真空 ›› 2022, Vol. 59 ›› Issue (2): 55-61.doi: 10.13385/j.cnki.vacuum.2022.02.11

半球谐振子金属化镀膜残余应力的测量方法及影响因素研究^*

朱蓓蓓¹, 刘青², 秦琳¹, 楚建宁², 陈肖², 汪学方², 许剑锋²

1.上海航天控制技术研究所,上海 201109;
2.华中科技大学,机械科学与工程学院,湖北武汉 430074

收稿日期:2021-02-24 出版日期:2022-03-25 发布日期:2022-04-14
通讯作者: 许剑锋,教授,博导。
作者简介:朱蓓蓓（1982-）,男,上海市人,工程师。
基金资助:
*装发部“十三五”装备预研共同技术项目（41423060208-HUST）

Research on Residual Stress Measuring Method and Influencing Factors of Metallized Coating on Hemispherical Harmonic Oscillator

ZHU Bei-bei¹, LIU Qing², QIN Lin¹, CHU Jian-ning², CHEN Xiao², WANG Xue-fang², XU Jian-feng²

1. Shanghai Institute of Aerospace Control Technology, Shanghai 201109, China;
2. School of Mechanical Science and Engineering, Huazhong University of Science and Technology, Wuhan 430074, China

Received:2021-02-24 Online:2022-03-25 Published:2022-04-14

摘要/Abstract

摘要： 半球谐振子金属化镀膜是半球谐振陀螺制造的重要工艺环节。镀膜过程所产生的薄膜残余应力对谐振子Q值有较大影响,决定着半球谐振陀螺零偏稳定性等最终性能。本文采用X射线衍射法测量薄膜残余应力,研究了镀膜工艺参数和膜层厚度对残余应力的影响,结果表明：薄膜残余应力均呈压应力状态;随着沉积速率的增大,薄膜应力先增大后减小,有转化为拉应力的趋势;随着膜层厚度的增加,薄膜应力先略微减小再增大;基底温度对残余应力的影响无明显规律。本文的研究对薄膜残余应力与谐振子Q值关系模型的建立具有重要指导意义。

关键词: 残余应力, 工艺参数, 金属化镀膜, 半球谐振子

Abstract: The hemispherical resonator metallization coating is an important process in the manufacture of hemispherical resonator gyroscope. The residual stress of the film produced during the coating process has a great influence on the Q value of the resonator, which determines the final performance of the hemispherical resonator gyroscope, such as the stability of the bias.In this paper, X-ray diffraction method is used to measure the residual stress of the film, and the influence of the coating process parameters and the thickness of the film on the residual stress is studied.The results show that the film residual stress exhibits a state of compressive stress. As the sputtering power increases, the film stress increases first and then decreases, and there is a tendency to transform into tonsile stress. When the film thickness increases, the film stress first decreases slightly and then increases. The substrate temperature has no obvious regularity in the influence of the residual stress. The research in this paper may have important guiding significance for the establishment of the relationship model between the residual stress of the film and the Q value of the harmonic oscillator.

Key words: residual stress, process parameter, metallized coating, hemispherical harmonic oscillator

中图分类号:

TB383

朱蓓蓓, 刘青, 秦琳, 楚建宁, 陈肖, 汪学方, 许剑锋. 半球谐振子金属化镀膜残余应力的测量方法及影响因素研究^*[J]. 真空, 2022, 59(2): 55-61.

ZHU Bei-bei, LIU Qing, QIN Lin, CHU Jian-ning, CHEN Xiao, WANG Xue-fang, XU Jian-feng. Research on Residual Stress Measuring Method and Influencing Factors of Metallized Coating on Hemispherical Harmonic Oscillator[J]. VACUUM, 2022, 59(2): 55-61.

参考文献 26

[1]	Rozelled M.The hemispherical resonator gyro: From wineglass to the planet[J]. Space Flight Mechanics, 2009, 134: 1-26.
[2]	李巍, 任顺清, 王常虹. 半球谐振陀螺仪谐振子品质因数不均匀引起的误差分析[J]. 航空学报, 2013, 34(1): 121-129.
[3]	陈雪, 任顺清, 赵洪波, 等. 半球谐振子薄壁厚度不均匀性对陀螺精度的影响[J]. 空间控制技术与应用, 2009, 35(3): 29-33.
[4]	张杰, 付雪松, 刘崇远. X射线衍射法测量残余应力的相对误差及不确定度评定[J]. 宇航材料工艺, 2018, 48(4): 71-74.
[5]	BYUN H R, YOUE A, HA Y G. Multifunctional hybrid multilayer gate dielectrics with tunable surface energy for ultralow-power organic and amorphous oxide thin-film transistors[J]. ACS Appl Mater Interfaces, 2017, 9: 7347-7354.
[6]	LAI C F, LI J S, SHEN C W.High-efficiency robust free-standing composited phosphor films with 2D and 3D nanostructures for high-power remote white LEDs[J]. ACS Appl Mater Interfaces, 2017, 9: 4851-4859.
[7]	BULGAREVICH K, SAKAMOTO K, AINARI T, et al.Spatially uniform thin-film formation of polymeric organic semiconductors on lyophobic gate insulator surfaces by self-assisted flow-coating[J]. ACS Appl. Mater. Interfaces, 2017, 9: 6237-6245.
[8]	MIZUSHIMA I, TANG P T, HANSEN H N, et al.Residual stress in Ni-W electrodeposits[J]. Electrochem.Acta, 2006, 51(27): 6128-6134.
[9]	ZHEMG Y, CHEN S F, RAINER F, et al.Film stress of micro-shutter arrays for the James Webb Space Telescope[C]. International Symposium on Smart Materials, Nano-, and Micro-Smart Systems, Melbourne: SPIE, 2002, 4935: 279-286.
[10]	LEPLAN H, GEENEN B, ROBIC J Y, et al.Residual stresses in evaporated silicon dioxide thin films: Correlation with deposition parameters and aging behavior[J]. Journal of Applied Physics, 1995, 78(2): 962-968.
[11]	THORNTON J A.The microstructure of sputter-deposited coatings[J]. Journal of Vacuum Science & Technology A-Vacuum Surfaces and Films, 1986, 4(6): 3059-30657.
[12]	AL-KHAWAJA S, ABDALLAH B, SHAKER S A, et al.Thickness effect on stress, structural,electrical and sensing properties of(002) preferentially oriented undoped ZnO thin films[J]. Composite Interfaces, 2015, 22(3): 221-231.
[13]	AL-MASHA′AL A, BUNTING A, CHEUNG R.Evaluation of residual stress in sputtered tantalum thin-film[J].Applied Surface Science, 2016, 371: 571-575.
[14]	LIU J, XU B, WANG H, et al.Effects of film thickness and microstructures on residual stress[J]. Surface Engineering, 2016, 32(3): 177-180.
[15]	陈焘, 罗崇泰. 薄膜应力的研究进展[J]. 真空与低温, 2006, 12(2): 69-72.
[16]	LIU G, YANG Y Q, HUANG B, et al.Effects of substrate temperature on the structure,residual stress and nano-hardness of Ti6Al4V films prepared by magnetron sputtering[J]. Applied Surface Science, 2016, 370: 53-58.
[17]	INAMDAR S, RAMUDU M, RAJA M M, et al.Effect of process temperature on structure, microstructure, residual stresses and soft magnetic properties of sputtered Fe70- Co30 thin films[J]. Journal of Magnetism and Magnetic Materials, 2016, 418: 175-180.
[18]	金鹏, 李喜德. 残余应力分析方法比较: X射线衍射法与应力释放法[J]. 实验力学, 2017, 32(5): 645-651.
[19]	黄玉波, 栗大超, 胡小唐, 等. 测量微悬臂梁曲率的相移显微干涉[J]. 光学精密工程, 2007, 15(9): 1398-1403.
[20]	向鹏, 金春水. Mo-Si多层膜残余应力的研究[J]. 光学精密工程, 2003, 11(1): 62-67.
[21]	MENG X Q, FAN X J, GUO H X.A new formula on the thickness of films deposited by planar and cylindrical magnetron sputtering[J]. Thin Solid Films, 1998, 335(1): 279-283.
[22]	马一博, 陈牧, 颜悦, 等. 薄膜应力测量方法及影响因素研究进展[J]. 航空材料学报, 2018, 38(1): 17-25.
[23]	MAGNUS O, JONATHAN A, GREGER H. The effects of bias voltage and annealing on the microstructure and residual stress of arc-evaporated Cr-N coatings[J]. Surface and Coating Technology, 1999, 120/121: 272-276.
[24]	于康, 孙亚非, 陈晓江. X射线衍射残余应力测试方法及应用[J]. 火箭推进, 2015, 41(2): 102-107.
[25]	孙婧晗. 半球谐振子金属化镀膜残余应力与膜厚均匀性研究[D]. 武汉: 华中科技大学, 2019.
[26]	姜传海, 杨传铮. 材料射线衍射和散射分析[M]. 北京: 高等教育出版社, 2010: 180-182.

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半球谐振子金属化镀膜残余应力的测量方法及影响因素研究^*

Research on Residual Stress Measuring Method and Influencing Factors of Metallized Coating on Hemispherical Harmonic Oscillator

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