真空 ›› 2022, Vol. 59 ›› Issue (6): 40-44.doi: 10.13385/j.cnki.vacuum.2022.06.07
陈兰兰, 孙小杰, 尉琳琳, 任月庆, 任冬雪, 梁文斌
CHEN Lan-lan, SUN Xiao-jie, WEI Lin-lin, REN Yue-qing, REN Dong-xue, LIANG Wen-bin
摘要： 在低温80℃的沉积条件下,采用等离子体增强原子层沉积（PEALD）技术在柔性聚对苯二甲酸乙二醇酯（PET）基底上制备氧化铝（Al2O3）阻隔薄膜。通过X射线光电子能谱、椭圆偏振仪测试分析表明,制备的Al2O3薄膜纯度较高,均匀性好。同时,通过调节沉积循环周期制备了不同厚度的Al2O3薄膜,研究了薄膜厚度对其表面形貌、表面粗糙度、透光率以及水汽透过率的影响。结果表明,沉积循环周期为500cycles时制备的 Al2O3薄膜性能最为优异,表面粗糙度为1.52nm,400~1200nm波长范围内平均透光率为90.4%,水汽透过率为3.15×10-3g·m-2·d-1。
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| [1] 魏海英, 郭红革, 秦莹莹, 等. 大气压介质阻挡放电等离子体辅助原子层沉积氧化铝阻隔膜[J]. 材料导报, 2018, 32(增刊2): 311-314. [2] 林晶, 于贵文, 孙智慧, 等. 等离子体增强原子层沉积增透阻隔膜的研究[J]. 真空科学与技术学报, 2021, 41(6): 566-570. [3] GUO H C, YE E, LI Z, et al.Recent progress of atomic layer deposition on polymeric materials[J]. Materials Science and Engineering C, 2017, 70(2): 1182-1191. [4] JARVIS K L, EVANS P J.Growth of thin barrier films on flexible polymer substrates by atomic layer deposition[J]. Thin Solid Films, 2017, 624(28): 111-135. [5] 明帅强, 王浙加, 吴鹿杰, 等. 原子层沉积法制备 SnO2薄膜及其对钙钛矿电池的性能影响[J]. 材料导报, 2022, 36(7): 122-127. [6] DAMERON A A, DAVIDSON S D, BURTON B B, et al.Gas diffusion barriers on polymers using multilayers fabricated by Al2O3 and rapid SiO2 atomic layer deposition[J]. Journal of Physical Chemistry C, 2008, 112(12): 4573-4580. [7] KIM H, LEE H B R, MAENG W J. Applications of atomic layer deposition to nanofabrication and emerging nanodevices[J]. Thin Solid Films, 2009, 517(8): 2563-2580. [8] HIRVIKORPI T, LAINE R, VÄHÄ-NISSI M, et al. Barrier properties of plastic films coated with an Al2O3 layer by roll-to-toll atomic layer deposition[J]. Thin Solid Films, 2014, 550: 164-169. [9] CARCIA P F, MCLEAN R S, HEGEDUS S.Encapsulation of Cu(InGa)Se2 solar cell with Al2O3 thin-film moisture barrier grown by atomic layer deposition[J]. Solar Energy Materials & Solar Cells, 2010, 94: 2375-2378. [10] HIRVIKORPI T, VÄHÄ-NISSI M, NIKKOLA J, et al. Thin Al2O3 barrier coatings onto temperature-sensitive packaging materials by atomic layer deposition[J]. Surface Coatings Technology, 2011, 205(21/22): 5088-5092. [11] GRONER M D, GEORGE S M, MCLEAN R S, et al.Gas diffusion barriers on polymers using Al2O3 atomic layer deposition[C]//Society of Vacuum Coaters Annual Technical Conference. Denver, 2006, 88: 051907. [12] LI M, GAO D, LI S, et al.Realization of highly-dense Al2O3 gas barrier for top-emitting organic light-emitting diodes by atomic layer deposition[J]. RSC Advances, 2015, 5: 104613. [13] 刘媛媛, 杜纯, 曹坤, 等. 沉积功率和退火工艺对 PE-ALD 氧化铝薄膜的影响[J]. 半导体制造技术, 2018, 43(8): 610-615. [14] LIM J W, YUN S J.Electrical properties of alumina films by plasma-enhanced atomic layer deposition[J]. Electrochemical and Solid State Letters, 2004, 7(8): F45. [15] LEE J G, KIM H G, KIM S S.Enhancement of barrier properties of aluminum oxide layer by optimization of plasma-enhanced atomic layer deposition process[J]. Thin Solid Films, 2013, 534: 515-519. [16] KIM J H, CHOI E Y, KIM B J, et al.Stability enhancement of GaInP/GaAs/Ge triple-junction solar cells using Al2O3 moisture-barrier layer[J].Vacuum, 2019, 162: 47-53. [17] OH J, SHIN S, PARK J, et al.Characteristics of Al2O3/ZrO2 laminated films deposited by ozone-based atomic layer deposition for organic device encapsulation[J]. Thin Solid Films, 2016, 599: 119-124. [18] 吴鹿杰, 文庆涛, 高雅增, 等. 基于原子层沉积技术的高精度多层膜X射线菲涅尔波带片的制备研究[J]. 光子学报, 2021, 50(1): 0123001. [19] KWON J H, JEONG E G, JEON Y, et al.Design of highly water resistant, impermeable, and flexible thin film encapsulation based on inorganic/organic hybrid layers[J]. ACS Applied Materials Interfaces, 2019, 11(3): 3251-3261. [20] 但威. 基于卷对卷的空间隔离原子层沉积方法及应用[D]. 武汉: 华中科技大学, 2018. |
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