Abstract: The metallization coating of the hemispherical resonator is an important process in the development of the hemispherical resonator gyroscope. For the requirement of maintaining a high Q value after the metallization of the hemispherical resonator, the high-precision preparation of nano metal films is required. In this paper, nano aluminum films were prepared on quartz glass substrates by DC magnetron sputtering with high purity Al as target material and high purity Ar as sputtering gas. The thickness, surface roughness and surface morphology of the films deposited under different sputtering power and chamber pressure were measured and characterized. The effects of process parameters on deposition rate, surface roughness and micro morphology of the Al films were discussed. The results show that the deposition rate of Al films increases with the increase of sputtering power. With the increase of chamber pressure, the deposition rate shows a trend of first increasing and then decreasing. With the increase of sputtering power, the grain size of the films increases, and with the increase of the chamber pressure, the particle diameter of the film increases first and then decreases. The as-coated film was the most uniform and compact under the condition of 100W sputtering power and 1.6Pa chamber pressure. The above conclusions have important guiding significance for the high-quality preparation of hemispherical harmonic oscillator curved nano films.

Key words: magnetron sputtering, hemispherical resonator, nano film, sputtering power, chamber pressure