VACUUM ›› 2024, Vol. 61 ›› Issue (2): 86-88.doi: 10.13385/j.cnki.vacuum.2024.02.15
• Lectures on Vacuum Technology and Its Application • Previous Articles Next Articles
CLC Number: O484;TB43
| [1] | LI Can-min, DONG Zhong-lin, XIA Zheng-wei, ZHANG Xin-feng, WEI Rong-hua. Microstructure and Properties of TiCr-based Nanocomposite Coatings by Plasma Enhanced Magnetron Sputtering [J]. VACUUM, 2024, 61(2): 10-15. |
| [2] | . [J]. VACUUM, 2024, 61(1): 87-88. |
| [3] | WU Xiao-hu, HU Shu-jie, SUN En-ze, ZHANG Xin, ZHAO Qi. Performance Regulation Approach of Fluorinated Amorphous Carbon Film for Large-space Building [J]. VACUUM, 2023, 60(6): 42-46. |
| [4] | ZHANG Yi-chen. No. 22:Chemical Vapor Deposition Technology [J]. VACUUM, 2023, 60(6): 87-88. |
| [5] | . [J]. VACUUM, 2023, 60(5): 102-104. |
| [6] | . [J]. VACUUM, 2023, 60(4): 85-88. |
| [7] | YU Kang-yuan, HE Yu-dan, YANG Bo, LUO Jiang-shan. Effect of Sputtering Voltage on Microstructure and Properties of Cu Foils Deposited by High Power Impulse Magnetron Sputtering [J]. VACUUM, 2023, 60(3): 1-4. |
| [8] | ZHU Jian-hua, PAN Jing, YUE Jian-ming, HAO Li-ping, ZHI Peng-wei, JIA Zhe. Structure and Luminescence Properties of Zn1-xSbxO Films Grown at Different Temperatures [J]. VACUUM, 2023, 60(3): 18-23. |
| [9] | XIANG Yu-chun, ZHU Jian-lei, YUAN Ya. Effect of Oxygen Pressure on the Properties of CuO Films Grown by Pulse Laser Deposition [J]. VACUUM, 2023, 60(3): 42-45. |
| [10] | . [J]. VACUUM, 2023, 60(3): 86-88. |
| [11] | ZHANG Han-yan, ZHENG Dan-xu, SHEN Yi, CHEN Yu-yun. Research of Insulation of Silicon Oxide Film Produced by Medium Frequency Magnetron Sputtering [J]. VACUUM, 2023, 60(2): 34-38. |
| [12] | . [J]. VACUUM, 2023, 60(2): 86-88. |
| [13] | . [J]. VACUUM, 2023, 60(1): 86-88. |
| [14] | LIU Qi, XU Jun-qi, SU Jun-hong, HAN Gang, LI Yang, YUAN Song-song. Study on Gradient Index Films Prepared by Thermal Evaporation Technology [J]. VACUUM, 2022, 59(6): 22-28. |
| [15] | ZHANG Jian, QI Zhen-hua, LI Jian-hao, NIU Xia-bin, XU Quan-guo, ZONG Shi-qiang. Growth, Characterization of ITO Films Deposited by DC Magnetron Sputtering [J]. VACUUM, 2022, 59(6): 45-50. |
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