欢迎访问沈阳真空杂志社 Email Alert    RSS服务

VACUUM ›› 2019, Vol. 56 ›› Issue (4): 37-39.doi: 10.13385/j.cnki.vacuum.2019.04.09

Previous Articles     Next Articles

TiN Nano-Thin Films Prepared by Magnetron Sputtering Reaction

WANG Huai-qian, JIANG Hong-wei   

  1. Mudanjiang Normal College, Mudanjiang 157000, China
  • Received:2018-10-20 Published:2019-08-22

Abstract: To study the effect of N2 pressure and flow on the growth of TiN films in magnetron sputtering, TiN films were grown at a substrate temperature of 300℃ for 2 hours using radio frequency magnetron sputtering equipment to change the air pressure and flow of N2. The morphology of TiN films was characterized by electron scanning microscopy. TiN films with different micro morphology can be prepared by changing technological parameters.

Key words: TiN, magnetron sputtering, N2 flow rate, N2 pressure rate

CLC Number: 

  • TB742
[1] Niyomsoan S,Grant W,Olson D L,et al.Variation of color in titanium and zirconium nitride decorative thin films[J]. Thin Solid Films,2002, 415:187-194.
[2] Taek-Soo Kim,,Sang-Shik Park, Byong-Taek Lee.Charact- erization of nano-structured TiN thin films preparedby R.F. magnetron sputtering[J]. Materials Letters,2005,59:3929-3932.
[3] Sundgren J E.Structure and properties of TiN coatings[J]. Thin Solid Films,1985,128:21-44.
[4] PalDey S, Deevi S C. Single layer and multilayer wear resistant coatings of(TiAl)N[J]. Materials Sciencean Engineering,2003,342:58-79.
[5] Vishnyakov V M, Bachurin V I, Minnebaev K F, et al.Ionassisted deposition of titaniumchromium nitride[J]. Thin Solid Films,2006,497(1-2):189-195.
[6] 杨凯. 反应磁控溅射法制备 TiN 薄膜的研究[D]. 南京:东南大学, 2006.
[7] Steyer P, Pilloud D, FPierson J, et al.Oxidation resistance improvement of arc-evaporated TiN hard coatings by silicon addition[J]. Surface and Coatings Technology,2007,201(7):4158-4162.
[8] 赵嘉学,童洪辉. 磁控溅射原理的深入探讨[J]. 真空,2004,41(4):74-79.
[9] 宋贵宏,杜昊,贺春林. 硬质与超硬涂层[M]. 北京:化学工业出版社,2007:52-59.
[10] Vaz F, Rebouta L, Goudeau P, et al. Structural transitions in hard Si-based TiN coatings:the effect of bias voltage and temperature[J]. Surface and Coatings Technology,2001,146-147:274-249.
[11] 刘雄飞,涂国辉.工艺参数对磁控溅射 TiN 膜成分影响的研究[J]. 真空科学与技术, 1999,19(3):225-227.
[12] 胡敏,刘莹,赖珍荃,等. 磁控溅射TiN薄膜的工艺及电学性能研究[J]. 功能材料,2009,2(40):222-225.
[13] 钟一昌,任兴润,黄柱,等.氮气流量对 TiN 薄膜组织结构及力学性能的影响[J].有色金属科学与工程,2016,7(3):47-53.
[14] 胡敏. 磁控溅射Ti/TiN 多层薄膜制备及其性能研究[D]. 南昌:南昌大学,2010.
[1] ZHANG Zi-xin, LIU Zhong-wei, YANG Li-zhen, CHEN Qiang. Study on Performance of Silicon-Based Nitride Phosphors Coated by Plasma-Assisted Atomic Layer Deposition [J]. VACUUM, 2019, 56(4): 19-23.
[2] SONG Jing-si, ZHAO Shuai, WANG Ting, CHEN Jiu-qiang, ZHANG Zhe-kui. Fine Grain Precision Casting Furnace [J]. VACUUM, 2019, 56(4): 44-48.
[3] QI Song-song, JING Jia-rong, DONG De-sheng, DONG Dong, WANG Fei, ZHANG Rui. Design of Pressure Regulating System for Vacuum Thermal Test Equipment [J]. VACUUM, 2019, 56(4): 62-64.
[4] SUN Chang-jin, ZHAO Yu-hui, WANG Zhi-guo, WU Jia-jun, HE Zhen-feng, WANG Xiao-fan. Development Status and Trend Research of Nondestructive Testing for Additive New-conceptual Structure [J]. VACUUM, 2019, 56(4): 65-70.
[5] LV Na, YU Sheng-bin, YAN Hong-yu, YU Qing-ming, QIAO Bao-zhen, WANG Ying-wu. Application of a New Type of Pressure Alternating Vacuum Drying Technology for Transformer Treatment [J]. VACUUM, 2019, 56(4): 74-77.
[6] WU Xing, JIANG Ai-hua, CHENG Yong. Effect of RF Power on Structure and Mechanical Properties of DLC Films [J]. VACUUM, 2019, 56(4): 34-36.
[7] ZHANG Zhi-ping. Design of Continuous Casting System for Electron Beam Melting Furnace [J]. VACUUM, 2019, 56(4): 40-43.
[8] ZHANG Fen-li, WANG Jie-feng, DENG Jing-lian, SUN Hui-fang. Application of self-cleaning anti-reflection coating in solar collector tube [J]. VACUUM, 2019, 56(3): 41-43.
[9] JIANG Xie-chang. Vacuum system fault diagnosing and troubleshooting [J]. VACUUM, 2019, 56(3): 1-5.
[10] LI Hao, WANG Dong-wei, ZHANG Chuan, LIU Chan, HUANG Mei-dong. Study on corrosion-resistance of Cr/CrN multilayers by arc ion plating [J]. VACUUM, 2019, 56(3): 21-26.
[11] LIU Chan, WANG Dong-wei, LI Xiao-min, WU Ying-tong, HUANG Mei-dong. Influence of pulsed negative bias on structure and properties of carbon films grown by magnetron sputtering [J]. VACUUM, 2019, 56(2): 69-73.
[12] HUANG HUA-yan, LIU Fang. Study of the electron-stimulated desorption equipment [J]. VACUUM, 2019, 56(2): 31-36.
[13] NING Yuan-tao, HUANG Tao, CHEN Qi, ZHANG Yan-shun , QI Xiao-jun. Optimization design of high-speed shafting for molecular pump based on finite-element method [J]. VACUUM, 2019, 56(1): 11-15.
[14] WANG Fu-zhen, CHEN Da-min, YAN Yuan-quan. The cleaning sources with argon ions using vacuum arc discharge technology [J]. VACUUM, 2019, 56(1): 27-33.
[15] DUAN Yong-li, Deng Wen-yu, QI Li-jun, LIU Kun, SUN Bao-yu, WANG Qing. Influence of Tb grain boundary diffusion on the magnetic performance and heat resistance of sintered NdFeB magnet [J]. VACUUM, 2018, 55(6): 76-79.
Viewed
Full text


Abstract

Cited

  Shared   
  Discussed   
No Suggested Reading articles found!