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VACUUM ›› 2020, Vol. 57 ›› Issue (5): 19-23.doi: 10.13385/j.cnki.vacuum.2020.05.05

• Thin Film • Previous Articles     Next Articles

Study on Depositing Rate of the Anatase TiO2Thin Film Preparated by the Direct Current Magnetron Sputtering Technique, Its Application in the Fabricating of Multilayer Films

WANG Zhao-yong1,2, LI Wei1,2, WANG Kai-hong1, LI Zong-ze1, LIU Zhi-qing1,2, YU Chen-sheng1, WANG Xin-lian1,2, WANG Xiao-ni3, WU Hao1, MA Pei-fang4   

  1. 1. Henan Provincial Engineering Laboratory of Building-Photovoltaics, Pingdingshan 467036, China;
    2. Institute of Sciences of Henan University of Urban Construction, Pingdingshan 467036, China;
    3. School of Physical Engineering and Laboratory of Material Physics, Zhengzhou University, Zhengzhou 450052, China;
    4. Pingding Shan Institute of Agricultural Sciences, Pingdingshan 467036, China
  • Received:2019-08-24 Published:2020-11-06

Abstract: Anatase TiO2 thin films were fabricated by DC magnetron sputtering technology(DCMS). The effects of the substrate temperature, pressure and sputtering power on the deposition rate of TiO2 films were studied. The surface morphology, structure and film thickness of the samples were characterized by field emission scanning electron microscopy(FESEM), X-ray diffractometer(XRD)and elliptical polarizer. The experimental results showed that the thin film was prepared as the single anatase phase and the surface is uniform. With the increase of the deposition temperature, the deposition rate of the thin film increased from 2.16nm/min to 4.03nm/min at the temperature from 100℃ to 400℃; The depositing rate decreased when the pressure increased. The deposition rates at the conditions of 0.75PA, 1.5 Pa and 3.0Pa are 4.48nm/min, 3.18nm/min and 2.42nm/min, respectively; The depositing rate increased as the sputtering power increased. The deposition rates corresponding to 100W, 295W, and 443W were 2.95nm/min, 3.18nm/min, and 7.50nm/min, respectively. In the end, double-layer TiO2 film was designed on the glass substrate using the TFC film system design software. The film was prepared on the ground of results. The experimental value and the theoretical design results are very consistent.

Key words: magnetron sputtering, anatse TiO2, depositing rate, elliptical method

CLC Number: 

  • O469
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