VACUUM ›› 2022, Vol. 59 ›› Issue (6): 45-50.doi: 10.13385/j.cnki.vacuum.2022.06.08
• Thin Film • Previous Articles Next Articles
ZHANG Jian, QI Zhen-hua, LI Jian-hao, NIU Xia-bin, XU Quan-guo, ZONG Shi-qiang
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[1] 廖亚琴, 李愿杰, 黄添懋. 透明导电薄膜现状与发展趋势[J]. 东方电气评论, 2014, 28(1): 13-18. [2] 李世涛, 乔学亮, 陈建国. 透明导电薄膜的研究现状及应用[J]. 激光与光电子学进展, 2003, 40(7): 53-59. [3] BAYRAKTAROGLU B, LEEDY K, BEDFORD R.High temperature stability of postgrowthannealed transparent and conductive ZnO: Al films[J]. Applied Physics Letters, 2008, 93(2): 022104. [4] BIE X, LU J G, GONG L, et al.Transparent conductive ZnO: Ga films prepared by DC reactive magnetron sputtering at low temperature[J]. Applied Surface Science, 2009, 256(1): 289-293. [5] CHEN L Y, CHEN W H, WANG J J, et al.Hydrogen-doped high conductivity ZnO films deposited by radio-frequency magnetron sputtering[J]. Applied Physics Letters, 2004, 85(23): 5628-5630. [6] CHEN X L, WANG F, GENG X H, et al.Natively textured surface Al-doped ZnO-TCO layers with gradual oxygen growth for thin film solar cells via magnetron sputtering[J]. Applied Surface Science, 2012, 258(8): 4092-4096. [7] CHO J S, BACK S H, JEONG C L.Surface texturing of sputtered ZnO:Al/Ag back reflectors for flexible silicon thin-film solar cells[J]. Solar Energy Materials and Solar Cells, 2011, 95(7): 1852-1858. [8] CROSSAY A, BUECHELER S, KRANZ L, et al.Spray-deposited Al-doped ZnO transparent contacts for CdTe solar cells[J]. Solar Energy Materials and Solar Cells, 2012, 101: 283-288. [9] 刘晓菲, 王小平, 王丽军, 等. 透明导电薄膜的研究进展[J].激光与光电子学进展, 2012, 49(10): 26-35. [10] 段学臣, 杨向萍. 新材料ITO薄膜的应用和发展[J]. 稀有金属与硬质合金, 1999(3): 58-60. [11] SUZUKI A, MATSUSHITA T, AOKI T, et al.Highly conducting transparent indium tin oxide films prepared by pulsed laser deposition[J]. Thin Solid Films, 2002, 411(1): 23-27. [12] YAO J L, HAO S, WILKINSON J S.Indium tin oxide films by sequential evaporation[J]. Thin Solid Films, 1990, 189(2): 227-233. [13] 夏冬林, 杨晟, 王树林, 等. ITO薄膜射频磁控溅射法制备及性能研究[J]. 玻璃与搪瓷, 2006(4): 13-16. [14] ALAM M J, CAMERON D C.Optical and electrical properties of transparent conductive ITO thin films deposited by sol-gel process[J]. Thin Solid Films, 2000, 377: 455-459. [15] SAWADA Y, KOBAYASHI C, SEKI S, et al.Highly-conducting indium tin oxide transparent films fabrieated by spray CVD using ethanol solution of indium(Ⅲ) chloride and tin(Ⅱ) chloride[J]. Thin Solid Films, 2002, 409(1): 46-50. [16] VASU V, SUBRAHMANYAM A. Reaction kinetics of the formation of indium tin oxide films grown by spray pyrolysis[J]. Thin Solid Films, 1990, 193/194(2): 696-703. [17] 蔡琪, 曹春斌, 江锡顺, 等. ITO薄膜的微结构表征及其组分特性[J]. 真空科学与技术学报, 2007, 27(3): 195-199. [18] 纪安妮, 孙书农, 柳兆洪, 等. 室温射频磁控溅射沉积ITO薄膜的研究[J]. 厦门大学学报(自然科学版), 1997, 36(2): 59-62. [19] TEIXEIRA V, CUI H N, MENG L J, et al.Amorphous ITO thin films prepared by DC sputtering for electrochromic applications[J]. Thin Solid Films, 2002, 420: 70-75. [20] GORJANC T C, LEONG D, PY C, et al.Room temperature deposition of ITO using r.f. magnetron sputtering[J]. Thin Solid Films, 2002, 413(1/2): 181-185. [21] BENDER M, SEELIG W, DAUBE C, et al.Dependence of oxygen flow on optical and electrical properties of DC-magnetron sputtered ITO films[J]. Thin Solid Films, 1998, 326(1/2): 72-77. [22] 江自然. ITO透明导电薄膜的制备方法及研究进展[J]. 材料开发与应用, 2010, 25(4): 68-71. |
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