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VACUUM ›› 2020, Vol. 57 ›› Issue (3): 17-20.doi: 10.13385/j.cnki.vacuum.2020.03.04

• Thin Film • Previous Articles     Next Articles

Effect of Sputtering Power on Microstructure of Er Thin Films Deposited by Magnetron Sputtering

ZHANG Qing-fang1,2, YI Yong1, LUO Jiang-shan2   

  1. 1. School of Material Science and Engineering, Southwest University of Science and Technology, Mianyang 621010, China;
    2. Research Center of Laser Fusion, China Academy of Engineering Physics, Mianyang 621900, China
  • Received:2019-12-19 Published:2020-06-18

Abstract: A series of erbium(Er) films were deposited by DC magnetron sputtering method. The effect of sputtering power on the microstructure of the Er thin films was investigated by X-ray diffraction and scanning electron microscope. The experimental results show that all the Er films deposited with the sputtering power of 20W~60W are mainly composed of hcp phase, and present(110) preferred orientation obviously. The Er films grow with typical columnar crystals that increase accordingly with the increasing of sputtering power. The Er films are dense and flat with the average grain size of 7.7nm~9.6nm and surface roughness of 2.1nm. The Er films deposited by magnetron sputtering exhibit different microstructural characteristics from other Er films grown by electron beam vapor.

Key words: magnetron sputtering, Er thin film, microstructure, preferred orientation

CLC Number: 

  • TB742
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