掩模基板镀膜工艺对铬膜与玻璃基底之间黏附力的影响

doi:10.13385/j.cnki.vacuum.2025.04.14

摘要/Abstract

摘要： 为提高掩模基板铬膜层与玻璃基底之间的黏附力,在Q6025石英玻璃基板上采用磁控溅射技术镀制三层铬膜,用两种黏附力监控方法研究了基底温度、溅射气氛和退火处理对膜基黏附力的影响。通过SEM对不同玻璃基底温度以及混合气氛下溅射得到的铬膜层进行了表征和微观形貌分析。研究结果表明：将玻璃基底加热到160 ℃能有效提升铬膜层与玻璃基底之间的黏附力。混合气氛下制备的铬膜层微观结构由50~60 nm的纯铬大颗粒和10~20 nm的氮氧化铬小颗粒掺杂组成,这种结构会进一步增强铬膜层与玻璃基底之间的黏附力。在300 ℃保温1 h的退火工艺则进一步优化了铬膜与玻璃基底之间的黏附力。

关键词: 掩模基板, 黏附力, 溅射气氛, 退火

Abstract: To improve the adhesion between the chromium film layer of the mask substrate and the glass substrate, three layers of chromium film were fabricated on the Q6025 quartz glass substrate by magnetron sputtering. Two adhesion monitoring methods were used to study the effects of substrate temperature, sputtering atmosphere and annealing treatment on the adhesion of chromium film layer and substrate, while SEM was utilized to characterize and analyze the microstructure of the chromium film layers sputtered under different glass substrate heating temperatures and mixed atmospheres. The results show that heating the glass substrate to 160 ℃ leads to a better adhesion between the chromium film layer and the glass substrate. In addition, the microstructure of the chromium film layer produced in the mixed atmosphere consists of 50-60 nm pure chromium particles and 10-20 nm chromium oxynitride particles, which enhances the adhesion between the chromium film layer and the glass substrate. The annealing temperature of 300 ℃ and the holding time of 1 h further optimize the adhesion between the chromium film and the glass substrate.

Key words: mask blank, adhesion force, sputtering atmosphere, annealing

中图分类号: TB741

李翼, 李伟, 徐根, 杨旭. 掩模基板镀膜工艺对铬膜与玻璃基底之间黏附力的影响[J]. 真空, 2025, 62(4): 75-80.

LI Yi, LI Wei, XU Gen, YANG Xu. Influence of Mask Blanks Sputtering Process on the Adhesion Between Chromium Film and Glass Substrate[J]. VACUUM, 2025, 62(4): 75-80.

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