沉积温度对管内高功率脉冲磁控溅射制备Cr涂层性能影响*

doi:10.13385/j.cnki.vacuum.2026.02.02

真空 ›› 2026, Vol. 63 ›› Issue (2): 13-21.doi: 10.13385/j.cnki.vacuum.2026.02.02

沉积温度对管内高功率脉冲磁控溅射制备Cr涂层性能影响^*

刘锦涛¹, 朱洪波², 牟清², 胡天时¹, 田修波¹, 巩春志¹, 耿慧远¹, 王子嘉¹

1.哈尔滨工业大学材料结构精密焊接与连接全国重点实验室,黑龙江哈尔滨 150001;
2.重庆长安望江工业集团有限公司,重庆江北 401133

收稿日期:2025-09-05 出版日期:2026-03-25 发布日期:2026-03-27
通讯作者: 田修波,教授,博导;耿慧远,副教授,博导。
作者简介:刘锦涛（2001-）,男,河南省内乡县人,硕士生。
基金资助:
^*国家自然科学基金资助项目（U2241233）

Effect of Deposition Temperature on the Properties of Cr Coatings Prepared by High Power Impulse Magnetron Sputtering Inside Tubes

LIU Jintao¹, ZHU Hongbo², MU Qing², HU Tianshi¹, TIAN Xiubo¹, GONG Chunzhi¹, GENG Huiyuan¹, WANG Zijia¹

1. National Key Laboratory of Precision Welding and Connection of Harbin Institute of Technology, Harbin, 150001, China;
2. Chongqing Chang'an Wangjiang Industrial Group Co., Ltd., Chongqing 401133, China

Received:2025-09-05 Online:2026-03-25 Published:2026-03-27

摘要/Abstract

摘要： 管内表面抗腐蚀性能的不足严重限制其使用寿命,因此在管内壁制备高质量的涂层尤为重要。本文采用双极性高功率脉冲磁控溅射技术,在管内放置柱状靶作为阴极来制备高质量Cr涂层。通过SEM、XRD、划痕、电化学腐蚀、高温氧化等方法对其进行表征和测试,研究了沉积温度对管内沉积的Cr涂层微观组织、力学性能、耐腐蚀性能以及高温氧化抗性的影响规律。研究结果表明,随着沉积温度从25 ℃升高到300 ℃,各组涂层均沿（110）面择优生长;受热应力影响,在100 ℃时涂层在韧性方面最优;而25 ℃条件下制备的涂层表现出最高的耐蚀性和高温氧化抗性,其中腐蚀电流最低可达4.9×10^-4 A·cm^-2,氧化层厚度最小,氧化增重最少,更小晶粒与更高致密度抑制腐蚀介质与氧扩散。沉积温度为100 ℃时涂层的耐蚀性和高温氧化抗性与沉积温度在25 ℃时相近,综合结构、力学与服役性能,100 ℃沉积涂层综合性能最优。

关键词: 内表面, 高功率脉冲磁控溅射, Cr涂层, 涂层/基体结合力, 耐蚀性

Abstract: The lack of anti-corcosion performance on the inner surface of the tube seriously limits its service life, so it is particularly important to prepare a high quality coating on the inner wall of the tube. In this paper, the bipolar high power impulse magnetron sputtering technology is used to place the cylindrical target as the cathode in the tube to prepare the high-quality Cr coating. Through SEM, XRD, scratches, electrochemical corrosion and high temperature oxidation, the influence of the deposition temperature on the microstructure, mechanical properties, corrosion resistance and oxidation resistance of Cr coating deposited in the tube was studied. The results show that as the deposition temperature increases from 25 ℃ to 300 ℃, the Cr coating exhibits a preferred (110) orientation; affected by thermal stress, the film exhibits the optimal toughness at 100 ℃; the coating prepared at 25 ℃ exhibits the highest corrosion resistance and high-temperature oxidation resistance. Among its properties, the corrosion current density can be as low as 4.9×10^-4 A·cm^-2, along with the smallest oxide layer thickness and the least oxidation weight gain. The smaller grain size and higher density inhibit the diffusion of corrosive media and oxygen. When the deposition temperature is 100 ℃, the corrosion resistance and oxidation resistance of the coating are similar to those at 25 ℃. Considering its microstructure, mechanical properties, and service performance comprehensively, the coating deposited at 100 ℃ exhibits the optimal overall performance.

Key words: inner surface, high power impulse magnetron sputtering(HiPIMS), Cr coating, film-substrate adhesion, corrosion resistance

中图分类号: TB43

刘锦涛, 朱洪波, 牟清, 胡天时, 田修波, 巩春志, 耿慧远, 王子嘉. 沉积温度对管内高功率脉冲磁控溅射制备Cr涂层性能影响^*[J]. 真空, 2026, 63(2): 13-21.

LIU Jintao, ZHU Hongbo, MU Qing, HU Tianshi, TIAN Xiubo, GONG Chunzhi, GENG Huiyuan, WANG Zijia. Effect of Deposition Temperature on the Properties of Cr Coatings Prepared by High Power Impulse Magnetron Sputtering Inside Tubes[J]. VACUUM, 2026, 63(2): 13-21.

参考文献

[1] 顾国成, 吴文森. 钢铁材料的防蚀涂层[M]. 北京:科学出版社, 1987.
[2] 张文, 邱长军, 曾小安, 等. 表面镀Cr膜锆合金的抗高温氧化性能研究[J]. 稀有金属与硬质合金, 2017, 45(6): 71-75.
[3] RIBIÈRE N, ESVAN J, ENGLER N, et al. An XPS and TEM study of the composition and structure of native oxides on the inner surface of as-received Ni base alloy steam generator tubes[J]. Applied Surface Science, 2024, 654: 159514
[4] MULLIGAN C P, SMITH S B, VIGILANTE G N,et al.Characterization and comparison of magnetron sputtered and electroplated gun bore coatings[J]. Joural of Pressure Vessel Technology,2006,128(5):240-245.
[5] 张菁. 化学气相沉积技术发展趋势[J]. 表面技术, 1996, 2 :1-3,55.
[6] 田民波. 薄膜技术与薄膜材料[M]. 北京:清华大学出版社, 2006.
[7] MATTOX D M.Handbook of physical vapor deposition (PVD) processing[M]. New Jersey: Noyes Publications, 1998.
[8] 于德洋, 翁立军. 物理气相沉积减摩与耐磨涂层[J]. 摩擦学学报, 1996,16(3):91-97.
[9] 贾嘉. 溅射法制备纳米薄膜材料及进展[J]. 半导体技术, 2004(7):70-73.
[10] ERDOĞAN E, KUNDAKÇI. Influence of substrate and substrate temperature on the structural, optical and surface properties of InGaN thin films prepared by RFMS method[J]. Microelectronic Engineering, 2019, 207:15-18.
[11] QIN X F, SUI C Y, DI L X.Influence of substrate temperature on the morphology and structure of bismuth thin films deposited by magnetron sputtering[J]. Vacuum, 2019, 166: 316-322.
[12] WU H P, TIAN X B, ZHENG L L, et al.Improvement of plasma uniformity and mechanical properties of Cr films deposited on the inner surface of a tube by an auxiliary anode near the tube tail[J]. Plasma Science & Technology, 2022, 24(5): 054008.
[13] 贾建, 郭会勇, 高晓光, 等. 漂移管工作温度对离子迁移率谱的影响[J]. 分析化学, 2006(12):1783-1786.
[14] 李望君. 压电薄膜/弹性基底结构的屈曲分析及Stoney公式[D].浙江工业大学,2018.
[15] SONG W L, SUN K, ZHAO G M, et al.Performance of MoS₂/Zr Composite Coatings at Different Deposition Temperatures[J]. Materials, 2021, 14(17):5100.
[16] NAKAMURA T, OKIMURA K.Ti ion density in inductively coupled plasma enhanced dc magnetron sputtering[J]. Vacuum, 2004, 74(3-4): 391-395.
[17] PARK J K, KIM J H, PARK S I, et al.Evolution of grain structure of as-deposited Cr thin films with deposition temperature[J]. Scripta materialia, 2003, 48(8): 1161-1166.
[18] ZHANG S, SUN D, FU Y Q, et al.Effect of sputtering target power on microstructure and mechanical properties of nanocomposite nc-TiN/a-SiN_x thin films[J]. Thin Solid Films, 2004, 447: 462-467.
[19] FERREIRA F, SERRA R, OLIVEIRA J C, et al.Effect of peak target power on the properties of Cr thin films sputtered by HiPIMS in deep oscillation magnetron sputtering (DOMS) mode[J]. Surface and Coatings Technology, 2014, 258: 249-256.
[20] LIN J L, MOORE J J, SPROUL W D, et al.Modulated pulse power sputtered chromium coatings[J]. Thin Solid Films, 2009, 518(5): 1566-1570.
[21] MUSIL J.Hard and superhard nanocomposite coatings[J]. Surface and Coatings Technology, 2000, 124(1-3): 322-330.
[22] ZHANG X, TIAN X B, ZHAO Z W, et al.Evaluation of the adhesion and failure mechanism of the hard CrN coatings on different substrates[J]. Surface & Coatings Technology, 2019, 364:135-143.
[23] GERTH J, WIKLUND U.The influence of metallic interlayers on the adhesion of PVD TiN coatings on high-speed steel[J]. Wear, 2008,264(9-10):885-892.
[24] LAKSHMI D V, BABU P S, L KRISHNA R, et al. Corrosion and erosion behavior of iron aluminide (FeAl(Cr)) coating deposited by detonation spray technique[J]. Advanced Powder Technology, 2021, 32(7): 2192-2201.
[25] QIAN C K, LIU Q, LI K J, et al.Electrochemical corrosion behavior variation of WC-10Co4Cr coating subjected to different magnetic treatments and its mechanism[J]. Corrosion Science, 2024, 229: 111883.

Metrics

Viewed

Full text

Abstract

Cited

Shared

Discussed

沉积温度对管内高功率脉冲磁控溅射制备Cr涂层性能影响^*

Effect of Deposition Temperature on the Properties of Cr Coatings Prepared by High Power Impulse Magnetron Sputtering Inside Tubes

摘要/Abstract

引用本文

使用本文

参考文献

相关文章 7

Metrics

本文评价

推荐阅读 10

[1]	俞磊, 田俊瑞, 曹磊, 曹志强. 不同制备方式对TiN涂层性能影响研究[J]. 真空, 2026, 63(1): 15-21.
[2]	徐海龙, 付宝全. 高Mo含量钛合金的真空制备及耐蚀性能研究[J]. 真空, 2023, 60(6): 53-60.
[3]	余康元, 何玉丹, 杨波, 罗江山. 溅射电压对高功率脉冲磁控溅射Cu箔微观结构及性能的影响^*[J]. 真空, 2023, 60(3): 1-4.
[4]	辛先峰, 刘林根, 林国强, 董闯, 丁万昱, 张爽, 王棋震, 李军, 万鹏. Zr₅₅Cu₃₀Al₁₀Ni₅非晶薄膜的制备与性能研究^*[J]. 真空, 2022, 59(5): 1-6.
[5]	张辉, 王晓波, 张炜鑫, 巩春志, 田修波. 基体偏压模式对CrN薄膜结构和阻氢性能的影响^*[J]. 真空, 2022, 59(1): 18-23.
[6]	张玉琛, 张海宝, 陈强. 高功率脉冲磁控溅射制备ZnO薄膜的研究进展^*[J]. 真空, 2021, 58(1): 72-77.
[7]	吴厚朴, 田钦文, 田修波, 巩春志. 新型双极性高功率脉冲磁控溅射电源及放电特性研究^*[J]. 真空, 2019, 56(6): 1-6.