真空 ›› 2020, Vol. 57 ›› Issue (2): 47-52.doi: 10.13385/j.cnki.vacuum.2020.02.09
夏翥杰1,2, 张治国1, 王红莉2, 苏一凡2, 唐鹏2, 林松盛2, 代明江2, 石倩2
XIA Zhu-jie1,2, ZHANG Zhi-guo1, WANG Hong-li2, SU Yi-fan2, TANG Peng2, LIN Song-sheng2, DAI Jiang-ming2, SHI Qianb2
摘要: 采用直流反应磁控溅射方法在室温下制备WO3薄膜。研究溅射功率对WO3薄膜结构及电致变色性能的影响规律,考察退火后WO3薄膜的结构演变及电致变色性能变化。结果表明溅射功率为270W时薄膜表现出较好的电致变色性能,其调制幅度达78.5%,着色时间为9s,褪色时间为3.2s。将该功率下制备的WO3薄膜进行退火处理,其结构由非晶态转变为晶态,但调制幅度、响应时间特性都发生一定程度的退化。非晶态WO3薄膜相比晶态结构具有更快的响应时间和更宽的调制幅度,但晶态薄膜具有更好的循环稳定性。
中图分类号:
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