真空 ›› 2019, Vol. 56 ›› Issue (3): 21-26.doi: 10.13385/j.cnki.vacuum.2019.03.05
李昊, 王东伟, 张川, 刘婵, 黄美东
LI Hao, WANG Dong-wei, ZHANG Chuan, LIU Chan, HUANG Mei-dong
摘要： 采用电弧离子镀技术制备了Cr/CrN多层膜,通过控制每个Cr层和CrN层的沉积时间获得不同调制比,从微观组织和腐蚀行为两方面研究了调制比对Cr/CrN多层膜的影响。结果表明,引入Cr层对CrN薄膜沉积过程中生长的柱状结构有抑制作用,孔隙率更低,结构更加致密。动电位极化曲线和电化学阻抗谱表明,与纯CrN薄膜相比,Cr/CrN多层膜的腐蚀电位增加了约100 mV,腐蚀电流密度降低一个数量级以上,多层膜的耐腐蚀性能得到明显提升。
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