VACUUM ›› 2021, Vol. 58 ›› Issue (1): 63-66.doi: 10.13385/j.cnki.vacuum.2021.01.13
• Thin Film • Previous Articles Next Articles
WU Ying-tong, LI Xiao-min, BAI Rui, WANG Dong-wei, WANG Yu, HUANG Mei-dong
CLC Number:
| [1] 晏鲜梅, 熊惟皓. 氮化钛硬质薄膜的制备方法[J]. 材料导报, 2006, 20: 36-38. [2] 杨波波. 多弧离子镀技术制备TiN基纳米复合多层膜及其性能研究[D]. 济南: 山东大学, 2019. [3] 张谷令, 王久丽, 杨武保, 等. 内表面栅极等离子体源离子注入TiN薄膜及其特性研究[J]. 物理学报, 2003, 52(9): 2213. [4] 王世雄, 陈长川. 国外硬质膜离子镀技术及其进展[J]. 工具技术, 1993(1): 4-8. [5] 刘恋. Cr12MoV钢表面电弧离子镀TiCN膜及复合处理技术研究[D]. 广州: 华南理工大学, 2019. [6] 匡君君, 姜春玉, 刘宏斌. 电弧离子镀技术在航空工业上的应用[J]. 电镀与精饰, 2016, 38(8): 23-26. [7] 张晓晖, 李建宇. 脉冲电流密度对磁控溅射制备TiN薄膜组织与性能的影响[J]. 材料保护, 2019, 52(7): 112-115. [8] 赵彦辉, 郎文昌, 肖金全, 等. 电弧离子镀的旋转横向磁场弧源设计[J]. 真空科学与技术学报, 2013, 33(4): 387-391. [9] Huang M D, Lin G Q, Zhao Y H, et al.Macro-particle reduction mechanism in biased arc ion plating of TiN[J]. Surface and Coating Technology, 2003, 176: 109-114. [10] 杨木. 多弧离子镀磁过滤装置关键技术研究[D]. 合肥: 合肥工业大学, 2018. [11] 张钧, 赵彦辉. 多弧离子镀技术与应用[M]. 北京: 冶金工业出版社, 2007. [12] 初国强, 刘星元, 刘云, 等. 加有电场的有机蒸发镀膜装置: 中国, 01208447. 6[P].2002-01-23[2020-4-22]. [13] Selwyn G S, Singh J, Bennett R S.In situ laser diagnostic studies of plasma-generated particulate contamination, J. Vac[J]. Sci. Technol. 1989, A7: 2758-2765. [14] Wu J J, Miller R J.Measurements of charge on submicron particles generated in a sputtering process[J]. J. Appl. Phys., 1990, 67: 1051-1054. [15] Nowlin R N, Carlile R N.The electrostatic nature of contaminative particles in a semiconductor processing plasma[J]. J. Vac. Sci. Technol. 1991, A9: 2825-2833. [16] 黄美东. 脉冲偏压电弧离子镀低温沉积研究[D]. 大连: 大连理工大学, 2002. [17] 李鹏, 黄美东, 佟莉娜, 等. 磁控溅射与电弧离子镀制备TiN薄膜的比较[J]. 天津师范大学学报(自然科学版), 2011, 31(2): 32-37. [18] 梁启超. 多弧离子镀TiN和TiAlN硬质薄膜的制备及性能研究[D]. 十堰: 湖北汽车工业学院, 2017. [19] 肖娜, 杜菲菲. 合理使用划痕法及显微法测定TiN薄膜与基体结合力[J]. 理化检验-物理分册, 2015, 51(9): 619-622. [20] 瞿全炎, 邱万奇, 曾德长, 等. 划痕法综合评定膜基结合力[J]. 真空科学与技术学报, 2009, 29(2): 184-187. [21] 郭岩, 叶智, 徐勃, 等. 多弧离子镀TiCrSiCN硬质薄膜的微观结构与摩擦学性能[J]. 电镀与涂饰, 2019, 38(21): 1166-1171. [22] 杨波波. 多弧离子镀技术制备TiN基纳米复合多层膜及其性能研究[D]. 济南: 山东大学, 2019. [23] 王淑庆. 物理气相沉积CrN和AlCrN薄膜的摩擦学性能[D]. 北京: 中国地质大学(北京), 2017. |
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