VACUUM ›› 2021, Vol. 58 ›› Issue (3): 51-54.doi: 10.13385/j.cnki.vacuum.2021.03.10
• Thin Film • Previous Articles Next Articles
YU Hua-jun, ZHAO Xi-jun, WU Rui-jun
CLC Number:
| [1] 李明亮, 刘利, 沈燕. Ag层厚度对AZO/Ag/AZO透明导电薄膜性能的影响[J]. 真空, 2020, 57(1): 31-34. [2] 聂鹏. 磁控溅射技术简介及其应用[J]. 数字化用户, 2019, 25(16): 192. [3] 石晓倩, 于荣环, 乌云额尔德尼, 等. 大连交通大学学报, 2019, 40(4): 108-111. [4] 孙艳, 倪庆宝, 张化福, 等. 靶基距对ZnMgO:Ti透明导电薄膜性能的影响[J]. 山东理工大学学报, 2019, 33(3): 43-46. [5] 于敏. 溅射靶材概述[J]. 金属材料研究, 2019, 45(1): 1-7. [6] 赵向杰. 磁控溅射镀膜技术的研究及发展趋势[J]. 合成材料老化与应用, 2020, 49(2): 120-122. [7] 张钦英, 陈颢, 任兴润, 等. Al靶溅射功率对CrAlN涂层组织结构及摩擦性能的影响[J]. 有色金属科学与工程, 2017, 8(5): 109-114. [8] ANTON R, LASKA N, SCHULZ U, et al.Magnetron supttered silicon coatings as oxidation Protection for Mo-based alloys[J]. Advanced Engineering Materials, 2020, 22(7): 19-21. [9] POLISHCHUK V A, TOMAEV V V, LEONOV N B.Formation of Zn films by magnetron sputtering on glass,quartz and silicon substrates[J]. Journal of Surface Investigation X-ray, Synchrotron and Neutron Techniques, 2020, 14(3): 459-463. [10] VU T D, LIU S Y, ZENG X T, et al.High-power impulse magnetron sputtering deposition of high crystallinity vanadium dioxide for thermochromic smart windows applications[J]. Ceramics International, 2020, 46(6): 8145-8153. [11] Ş [12] DHAGE S R, BADGUJAR A C.Transparent conducting Al: ZnO thin films on large area by efficient cylindrical rotating DC magnetron sputtering[J]. Journal of Alloys and Compounds, 2018, 763: 504-511. [13] AROCKIADOSS T, KOVENDHAN M, JOSEPH D P, et al.DC magnetron sputtered aligned ITO nano-rods with the influence of varying oxygen pressure[J]. Applied Surface Science, 2018, 449: 39-47. [14] RASHID H, RAHMAN K S, HOSSAIN M I, et al.Physical and electrical properties of molybdenum thin films grown by DC magnetron sputtering for photovoltaic application[J]. Results in Physics, 2019, 14: 34-38. [15] POTERA P, WISZ G, ŁUKASZ S.Optical properties of AlN layers obtained by magnetron sputtering. Materials Science-Poland, 2018, 36(4): 717-721. |
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